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2022 |
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Study on How Ultrapure Water Could Contribute to Particle Types Identified on Wafer, and How Ion Exchange Resin Selection Could Make a Difference
Particle contamination in ultrapure water (UPW) remains a high challenge in yield enhancement to achieve more functional die per wafer. IRDS requirement on acceptable particle size in UPW is getting more stringent year by year as semiconductor technology advances. Besides native particles, IRDS also shows growing concern on particle precursors such as dissolved molecular compound which may form solid particles when dried on wafer surface. Our study on the particle types released through a UPW system and its comparison to those found on wafers helps us identify the target particles and particle precursors to be removed from UPW. One of the target process consumables to be studied on the release of particles and particle precursors to UPW is ion exchange resin. Through our investigation on two different ion exchange resins, resin selection is shown to be critical in reducing the release of particles and particle precursors in both short and long terms.
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Yoichi Tanaka;
Hideaki Iino;
Jas Cheong;
Roberto Naranjo;
Takeo Fukui, Karine Kenis, Jens Rip, Kurt Wostyn
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Organic Contamination; Particles; UPW; IRDS |
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2022 |
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Interconnect Metal Recess Using Functional Water Solutions
For the dimensional scaling and performance enhancement of upcoming semiconductor devices, metal wire lines and space minimization are required. However, due to the technical limitation of mask locational alignment accuracy, wiring layer has short circuits and semiconductor performance deteriorates. To prevent short circuit by the misalignment, metal recess technology with etch back metal layer as atomic scale to fill dielectrics and create allowable gap length is required. Furthermore, wire metal has been changed to make interconnect line resistance lower from copper (Cu) to cobalt (Co) and molybdenum (Mo), new wet solutions which are optimize for each is demanded
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Yoichi Tanaka;
Nobuko Gan, Hideaki lino, Takeo Fukui, Yusuke Oniki, Antoine Pacco, Jens Rip, Kurt Wostyn, Efrain Altamirano- Sanchez imec
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High Purity Chemicals |
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2021 |
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Study on particle behavior in ultrapure water
This presentation was given as part of the Ultrapure Micro 2021 annual conference. It was given as part of the ultrapure water strand.
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Yoichi Tanaka;
Hideaki Iino;
Minoru Uchida; Takaaki Togo; Toshimasa Kato; Yuichi Ogawa
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Filtration; Particles; Particle Count and Detection |
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2021 |
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Functional water solutions to enable advanced wet cleaning process for next-generation semiconductor device manufacturing
This presentation was given as part of the Ultrapure Micro 2021 annual conference. It was given as part of the ultrapure water strand.
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Hideaki Iino;
Yoichi Tanaka;
Efrain Altamirano-Sanchez; Frank Holsteyns; Nobuko Gan; Shota Iwahata; Takeo Fukui; Yusuke Oniki; Yuya Akanishi
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Fouling; Scaling and Corrosion; Copper; Metal Contamination |
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2020 |
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Water and Resources Conservation - Q&A
This Q&A session took place at the 2020 Ultrapure Micro annual conference. It was a part of the Water Management and Wastewater Treatment track, and included speakers from the Water and Resources Conservation session.
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Jochen Ruth;
Gerd Heser;
Tanaka Yu; Thomas Huang
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Environmental Impact and Compliance; Cost Management; Wastewater Reclamation and Reuse; Energy Conservation |
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2020 |
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UPW System Improvement - Q&A
This Q&A session took place at the 2020 Ultrapure Micro annual conference. It was a part of the Ultrapure Water Production track, and included speakers from the UPW System Improvement session.
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Josh Best;
Jesica Beccue;
Atsushi Muramatsu; Kristy Bellview; Majid Entezarian
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UPW System; Ion Exchange; Membranes; Silica |
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2020 |
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Construction of a new wastewater recovery system / business model
This presentation was given at the Ultrapure Micro 2020 annual conference. It was presented in the Water Management and Wastewater Treatment track, as part of the Water and Resources Conservation session.
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Ikuno Nozomu; Tada Keijiro; Tanaka Yu
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Wastewater Reclamation and Reuse; Environmental Impact and Compliance; Membranes; Reverse Osmosis (RO); Cost Management; Fouling; Scaling and Corrosion |
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2020 |
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Risks incurred chemical state change of silica in ion exchange resins and their countermeasures
This presentation was given at the Ultrapure Micro 2020 annual conference. It was presented in the Ultrapure Water Production track, as part of the UPW System Improvement session.
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Atsushi Muramatsu; Kotaro Yonezu; Masahito Tochinai; Takaaki Chuuman; Takushi Yokoyama; Teruhisa Katou; Yasuharu Minato
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Silica; Ion Exchange |
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2019 |
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Productive and Analytical Technologies of pg/L (ppq) Grade Metals in UPW
This presentation was given at the Ultrapure Micro 2019 annual conference. It was presented in the Ultrapure Water Production track, as part of the Analytical session.
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Daiki Naganuma; Nobuhiro Tsuruma; Toshimasa Kato; Yasuharu Minato
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Metal Contamination; Metrology and Analytical Technology; UPW Polishing; Ion Exchange |
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2019 |
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Silica and Boron Removal using EDI, and Analytical Technology
This presentation was given at the Ultrapure Micro 2019 annual conference. It was presented in the Ultrapure Water Production track, as part of the Innovative Design session.
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Kunihiro Iwasaki; Takaaki Chuuman; Teruhisa Katou; Toshimasa Kato
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Metrology and Analytical Technology; Silica |
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