Particle contamination in ultrapure water (UPW) remains a high challenge in yield enhancement to achieve more functional die per wafer. IRDS requirement on acceptable particle size in UPW is getting more stringent year by year as semiconductor technology advances. Besides native particles, IRDS also shows growing concern on particle precursors such as dissolved molecular compound which may form solid particles when dried on wafer surface. Our study on the particle types released through a UPW system and its comparison to those found on wafers helps us identify the target particles and particle precursors to be removed from UPW. One of the target process consumables to be studied on the release of particles and particle precursors to UPW is ion exchange resin. Through our investigation on two different ion exchange resins, resin selection is shown to be critical in reducing the release of particles and particle precursors in both short and long terms.

For the dimensional scaling and performance enhancement of upcoming semiconductor devices, metal wire lines and space minimization are required. However, due to the technical limitation of mask locational alignment accuracy, wiring layer has short circuits and semiconductor performance deteriorates. To prevent short circuit by the misalignment, metal recess technology with etch back metal layer as atomic scale to fill dielectrics and create allowable gap length is required. Furthermore, wire metal has been changed to make interconnect line resistance lower from copper (Cu) to cobalt (Co) and molybdenum (Mo), new wet solutions which are optimize for each is demanded

This presentation was given as part of the Ultrapure Micro 2021 annual conference. It was given as part of the ultrapure water strand.

This presentation was given as part of the Ultrapure Micro 2021 annual conference. It was given as part of the ultrapure water strand.

This Q&A session took place at the 2020 Ultrapure Micro annual conference. It was a part of the Water Management and Wastewater Treatment track, and included speakers from the Water and Resources Conservation session.

This Q&A session took place at the 2020 Ultrapure Micro annual conference. It was a part of the Ultrapure Water Production track, and included speakers from the UPW System Improvement session.

This presentation was given at the Ultrapure Micro 2020 annual conference. It was presented in the Water Management and Wastewater Treatment track, as part of the Water and Resources Conservation session.

This presentation was given at the Ultrapure Micro 2020 annual conference. It was presented in the Ultrapure Water Production track, as part of the UPW System Improvement session.

This presentation was given at the Ultrapure Micro 2019 annual conference. It was presented in the Ultrapure Water Production track, as part of the Analytical session.

This presentation was given at the Ultrapure Micro 2019 annual conference. It was presented in the Ultrapure Water Production track, as part of the Innovative Design session.