Company Profile
Organo
Based in Tokyo, Japan
Services
OEM systems suppliers
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Ultrapure water production & management
- Filtration
- Ion exchange
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Water management & waste streams treatment & reuse
- Hydrofluoric acid treatment
- Cooling water systems
About
Organo is a system integrator specializing in ultrapure water production, wastewater treatment and reclaim systems. The company, which is present in the outsourcing market through O&M and BOO contracts, mainly serves the Japanese and Taiwanese microelectronics industries and plans to further expand in Asia and the US market. It has just opened Organo USA, Inc. in 2021.
Organo also provides technology used for the recovery of resources such as hydrofluoric acid, solvents and rare metals. The company has also applied its high-purity technology for ultrapure chemicals refining systems.
Badges
| Id | Year | Materials | Info | Company | Author | Tags | View |
|---|---|---|---|---|---|---|---|
| ... | 2021 |
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Reliability evaluation of liquid particle counter (LPC) using field-flow fractionation toward accurate particle measurementThis presentation was given as part of the Ultrapure Micro 2021 annual conference. It was given as part of the ultrapure water strand.
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... | Fumitaka Ichihara; Hiroshi Sugawara; Tsukasa Kondo; Ayako Nakamura; Haruhisa Kato | Particle Count and Detection; Particles | View |
| ... | 2021 |
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Metal removal life test and organic impurity of ion exchange resinThis presentation was given as part of the Ultrapure Micro 2021 annual conference. It was given as part of the combined track, which contained presentations on airborne molecular contamination (AMC) and high purity gases, and ultra high purity chemicals.
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... | Shota Morino; Noriko Hisano; Yukinari Yamashita; Ayano Kato; Yukari Nitanai | Isopropyl Alcohol (IPA); Metal Contamination; Ion Exchange; Membranes; Organic Contamination | View |
| ... | 2017 |
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Investigation of the behaviour of 10 nm particles and systems for reducing particles to produce ultrapure waterIn recent years, with the development of the semiconductor manufacturing process, ultrapure water (UPW) used to wash semiconductor devices have required high purity. In particular, particles in UPW are strictly controlled. Our 10 nm SEM analysis can measure 10 nm particles, which was previously impossible. This article presents the results of measuring 10 nm particles in the existing ultrapure water system. We clarified the behaviour (including generation sources and compositions) of 10 nm particles in ultrapure water systems in order to optimize and enhance. This article was originally published in the Ultrapure Micro Journal in November 2017.
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... | Fumitaka Ichihara; Hiroshi Sugawara; Masami Murayama; Kyohei Tsutano; | Particle Count and Detection; Particles; UPW System | View |
| ... | 2020 |
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UPW Contamination Control - Q&AThis Q&A session took place at the 2020 Ultrapure Micro annual conference. It was a part of the Ultrapure Water Production track, and included speakers from the UPW Contamination Control session.
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... | Glen Slayter; Dan Rodier; Kyohei Tsutano; Sid Sampath | Particle Count and Detection; Metal Contamination; Filtration; Nanoparticles | View |
| ... | 2020 |
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Trace metal analysis (ppq level) in ultrapure water using Monolith as an ion concentratorThis presentation was given at the Ultrapure Micro 2020 annual conference. It was presented in the Ultrapure Water Production track, as part of the UPW Contamination Control session.
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... | Kyohei Tsutano; | Metal Contamination; Ion Exchange | View |
| ... | 2019 |
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Xe Recovery and Reuse System from Etching Process Exhaust GasThis presentation was given at the Ultrapure Micro 2019 annual conference. It was presented in the Ultra High Performance Chemicals and High Purity Gases track, as part of the High Purity Gases & Precursors session.
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... | Takashi Futatsuki; Yoshinori Ono; Yuki Nakamura | High Purity Gases; Metrology and Analytical Technology | View |
| ... | 2019 |
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Ultrapure CO2 Supply and Recycle System for the Supercritical CO2 Drying Process in Nano-Scale Semiconductor ManufacturingThis presentation was given at the Ultrapure Micro 2019 annual conference. It was presented in the Ultra High Performance Chemicals and High Purity Gases track, as part of the High Purity Gases & Precursors session.
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... | Takashi Futatsuki; Hiroshi Sugawara; Yoshinori Ono | High Purity Gases; Particle Count and Detection; Metrology and Analytical Technology | View |
| ... | 2019 |
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Optimized Combination of Cationic and Anionic Ion Exchange Resins for the Removal of Trace Amount of Metal Impurities from Isopropyl AlcoholThis presentation was given at the Ultrapure Micro 2019 annual conference. It was presented in the Ultra High Performance Chemicals and High Purity Gases track, as part of the Onsite Purification session.
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... | Noriko Hisano; Yui Shioya; Yasuhiro Yoshimura; Haruo Yokota | Metrology and Analytical Technology; Ion Exchange; Metal Contamination; Isopropyl Alcohol (IPA) | View |
| ... | 2019 |
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The Pretreatment Method for High Water Recovery RO SystemThis presentation was given at the Ultrapure Micro 2019 annual conference. It was presented in the Water Management and Wastewater Treatment track, as part of the New Approaches in Water Management session.
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... | Taro Oe; Akhiro Takada; Toru Nakano | Reverse Osmosis (RO); Water Consumption and Conservation; Environmental Impact and Compliance | View |
| ... | 2019 |
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Synthesis and Application of New Ion Exchanger for Ultra Pure Water TreatmentThis presentation was given at the Ultrapure Micro 2019 annual conference. It was presented in the Ultrapure Water Production track, as part of the Enabling Technology session.
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... | Kyohei Tsutano; Daisaku Yano; Hitoshi Takada | Ion Exchange; Metal Contamination | View |