Company Profile
Ovivo
Based in Montreal, Canada
Services
About
Ovivo is a world leader in water purification and treatment thanks to our incredible expertise, knowledge, proprietary products, and decades of experience. Our experts can solve any water treatment issue in a sustainable, efficient, and innovative way.
Through continual, cutting-edge innovations, Ovivo succeeds in delivering viable solutions to support the complex demands of the semiconductor sector, removing recalcitrant contamination including particles. We provide systems exceeding industry requirements while creating new standards for UPW technologies, such as metal free polishing.
Our commitment to developing exclusive solutions through research, engineering, and field service makes Ovivo the preferred partner for those who value water as much as we do.
Badges
| Year | Materials | Info | Company | Author | Tags | View |
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| 2021 |
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Effect of dissolved gas in UPW on particle detection using an acoustic particle counterThis presentation was given as part of the Ultrapure Micro 2021 annual conference. It was given as part of the ultrapure water strand.
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... | Ian Briggs; Luciano Clary; Philippe Rychen; Najib Alia; Pia Herrling; | Particles; Particle Count and Detection; Dissolved Gases | View |
| 2021 |
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Nanoparticle adsorption of polish IEX resins investigated by magnetic resonance imagingThis presentation was given as part of the Ultrapure Micro 2021 annual conference. It was given as part of the ultrapure water strand.
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... | Pia Herrling; Philippe Rychen; Frando Sinaga; Gisela Guthausen; Nicolas Schork | UPW Polishing; Ion Exchange; Nanoparticle; Particle Count and Detection | View |
| 2020 |
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Can Nanoparticles penetrate UPW polishing resins? Nanoscale particle interactions by high resolution imaging of single resin beadsThis presentation was given at the Ultrapure Micro 2020 annual conference. It was presented in the Ultrapure Water Production track, as part of the UPW Process Optimization session.
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... | Pia Herrling; Philippe Rychen; Eva Mayrose; Gisela Guthausen | Nanoparticles; UPW Polishing; Ion Exchange; Metrology and Analytical Technology | View |
| 2020 |
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Fundamentals of Acoustic Particle Counting and Validation for UPW MonitoringThis presentation was given at the Ultrapure Micro 2020 annual conference. It was presented in the Ultrapure Water Production track, as part of the Critical Particle Monitoring session.
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... | Najib Alia; Ian Briggs; Pia Herrling; Philippe Rychen; | Particle Count and Detection; Case Study; Particles | View |
| 2020 |
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Proactive Solutions in Water Management for Advanced Semiconductor ManufacturersWater management at advanced facilities has become increasingly complex. The manufacture of the new generation of technologies has increased water demands and posed new challenges for internal and external infrastructure. This webinar focused on proactive solutions and strategies based on recent developments in SEMI Standards. The panel then discussed risk management, environmental compliance, reliability issues and data management for water management challenges.
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... | Slava Libman; Paul Kerr; Alex Milshteen; Philippe Rychen; Dan Wilcox; Michael Knapp; | SEMI; Wastewater Reclamation and Reuse; PFAS; Environmental Impact and Compliance; Data Management | View |
| 2020 |
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Critical Particle Monitoring - Q&AThis Q&A session took place at the 2020 Ultrapure Micro annual conference. It was a part of the Ultrapure Water Production track, and included speakers from the Critical Particle Monitoring session.
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... | Gary van Schooneveld; Najib Alia; Derek Oberreit; | Particle Count and Detection; Nanoparticles; Particle Precursors | View |
| 2020 |
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UPW Process Optimization - Q&AThis Q&A session took place at the 2020 Ultrapure Micro annual conference. It was a part of the Ultrapure Water Production track, and included speakers from the UPW Process Optimization session.
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... | Gil Maron; Pia Herrling; Charlie Chan | Metrology and Analytical Technology; Nanoparticles; Membranes; Ion Exchange; UPW Polishing | View |
| 2019 |
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Ion Exchange Resins for Advanced Removal of Nanoparticles from UPW? – A Novel Imaging ApproachThis presentation was given at the Ultrapure Micro 2019 annual conference. It was presented in the Ultrapure Water Production track, as part of the Enabling Technology session.
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... | Pia Herrling; Philippe Rychen; Gisela Guthause; Katharina Kopania | Nanoparticles; Ion Exchange; UPW Polishing; Metrology and Analytical Technology | View |
| 2019 |
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Semiconductor Wastewater Treatment by MEC for the Effective Removal of Fluorides and PhosphatesThis presentation was given at the Ultrapure Micro 2019 annual conference. It was presented in the Water Management and Wastewater Treatment track, as part of the New Approaches in Water Management session.
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... | Deena Starkel; Philippe Rychen; Jim Nielsen; Markus Duppel; Sylvain Keav | Fluoride; Membranes | View |
| 2019 |
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Process LC-OND-Analyzer for Urea MonitoringThis presentation was given at the Ultrapure Micro 2019 annual conference. It was presented in the Water Management and Wastewater Treatment track, as part of the Facilitating Water Management session.
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... | Philippe Rychen; F. Hu; Ignacy Kieler; S. Huber | Organic Contamination; Total Organic Carbon (TOC); Metrology and Analytical Technology; Ammonia | View |