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2022 |
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Deconstructing the Challenges of Facility 2.0: Device Complexity Drives Facility Complexity
A discussion of how the production of new complex devices is causing complications for the construction and operation of huge new semiconductor facilities.
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Dan Wilcox;
Anthony Jeffers; Brandon Ekberg; Danny Zhu; Nabil Mistkawi
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Construction; High Purity Gases; High Purity Chemicals; Supply Chain |
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2022 |
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2022 IRDS & SEMI Standards Update
Enabling Advanced Semiconductor Yield via Proactive Technology Management - an overview of the IRDS research work and future roadmap, as well as SEMI standard and future focus areas.
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Gary van Schooneveld;
Slava Libman;
Dan Wilcox;
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SEMI; IRDS; Sustainability; Particle Precursors; Energy Conservation; Water Conservation |
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2022 |
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Deconstructing the Challenges of Facility 2.0: Expertise in Semiconductor Facilities Operations
Held in May 2022, this is the second meeting in the UPM Community Event Series 'Deconstructing the Challenges of Facility 2.0'
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Bob McIntosh;
Elizabeth Betancourt;
Dan Wilcox;
Kenneth Sullivan; Niall Maher
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End-user; Facility 2.0 |
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2022 |
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Deconstructing the Challenges of Facility 2.0: Yield & Reliability Drivers
Presentation given at April 7th 2022 online UPM Community event.
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Slava Libman;
Dan Wilcox;
Mustafa Badaroglu; Supika Mashiro
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End-user; Data Management; Modeling; Risk Management; Yield |
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2021 |
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Enabling advanced semiconductor yield via proactive technology management
This presentation was given as part of the Ultrapure Micro 2021 annual conference. It was given as a keynote presentation
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Slava Libman;
Gary van Schooneveld;
Dan Wilcox;
Bonnie Marion;
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IRDS; SEMI; Risk Management; Particle Precursors; Wafer Defectivity |
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2020 |
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Proactive Solutions in Water Management for Advanced Semiconductor Manufacturers
Water management at advanced facilities has become increasingly complex. The manufacture of the new generation of technologies has increased water demands and posed new challenges for internal and external infrastructure. This webinar focused on proactive solutions and strategies based on recent developments in SEMI Standards. The panel then discussed risk management, environmental compliance, reliability issues and data management for water management challenges.
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Slava Libman;
Paul Kerr;
Alex Milshteen;
Philippe Rychen;
Dan Wilcox;
Mike Knapp;
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SEMI; Wastewater Reclamation and Reuse; PFAS; Environmental Impact and Compliance; Data Management |
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2020 |
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Substrate Environment Contamination Control - The Manufacturing Tools Perspective
This webinar features a presentation from Nabil Mistkawi, Samsung Austin Semiconductor, who identifies key technology requirements for wet chemicals and gases from an end user perspective. This was followed by an engaging discussion between tool OEM companies and end users, as they explored the contamination control needs of individual environments, showing where contamination impacts the process, thereby bringing together the supply chain with the clean room.
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James Snow;
Rushi Matkar;
Dan Wilcox;
Slava Libman;
Abbas Rastegar; Jim Snow; Marcel Teunissen; Nabil Mistkawi
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IRDS; Metrology and Analytical Technology; Wafer Defectivity; End-user; Ultraviolet (UV) |
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2020 |
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Semiconductor Industry Needs in UPW and Water Management During Turbulent Times
This webinar begins with Slava Libman, FTD Solutions, presenting the annual International Roadmap for Devices and Systems (IRDS) and SEMI Standards Update. Following the presentation we continue with a panel discussion exploring risk management, resilience, and sustainability within the industry. Using the IRDS roadmap as an outline, our expert panellists discuss the continuing need for making improvements to technological gaps and facilities’ environmental footprints, whilst building a secure and sustainable future for the industry.
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Slava Libman;
Rushi Matkar;
Alex Milshteen;
Bob McIntosh;
Alan Knapp;
Dan Wilcox;
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IRDS; SEMI; Environmental Impact and Compliance; Risk Management; Particle Count and Detection |
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2020 |
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Technology Roadmap - Focusing on Enabling Yield of Next Generation Devices
This presentation was given at the Ultrapure Micro 2020 annual conference. It was presented as a Keynote presentation.
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Slava Libman;
Dan Wilcox;
Andreas Neuber;
Bob McIntosh;
Christoph Hocke; Kevin Prettyman; Nabil Mistkawi
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IRDS; Particle Precursors; Wafer Defectivity |
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