What's New in UPM? April 2022

Most viewed - a rundown of our most popular resources this month

• Most viewed member insight: The Importance of High Purity Water in Microelectronics written by Alan Knapp, at Evoqua Water Technologies
• Most viewed conference presentation: Study on Particle Behavior in Ultrapure Water presented by Yoichi Tanaka,Kurita Water Industries
• Most viewed technical article: Characterizing the retention of UPW filters using enhanced SEMI C79 testing by Gary Van Schooneveld, Don Grant, and Mark Litchy at CT Associates with Kevin Cresswell and Uwe Beuscher at, W L Gore & Associates
• Most viewed Community Event material: Slides from the opening remarks at the February roundtable event on Sustainable Water Usage in Semiconductor Manufacturing, delivered by Paul Kerr, at Intel

New members
Members who joined the UPM Platform in the last two months

• Jim De Boer (SCREEN)
• Hiep Le (Gradiant)
• Joerg Winter (DAS Environmental Expert)
• Nadine Siebdrath, (DAS Environmental Expert)
• Mats Malmqvist and Krister Ripstrand (Nanosized Sweden)
• Mustafa Badaroglu (Qualcomm)
• Supika Mashiro (Tokyo Electron)
• Patrick Smith (Dupont)
• Robert Schmidt (phD researcher)
• Heather Reese (Ecolab)
• Masamitsu Iiyama (Nomura Micro Science)
• Weng Cheang (Arcade Engineering).
• Gamal Elhag Idris (Independent)

If their profile is visible and their chat system enabled, interact with them in our members hub.

Call for AbstractsWe are excited to announce that we are now accepting abstracts for speakers at the Ultrapure Micro 2022 Annual Conference! With an agenda steered by industry experts, the annual conference provides strong technical papers to support the collaboration between end-users and service or technology providers.
The annual conference will be held from the 28th – 30th of September 2022. Please submit your abstract via this form by May 23rd 2022, at 11:59PM PST. Please find extended information about the conference theme, as well as what makes a successful submission, here.
In 2022, the scale of construction for manufacturing facilities is unprecedented. The next generation of fabs are not only huge in terms of footprint, but are also extremely complex, with EUV tools and 3D geometries included for the first time. The management of these facilities will be demanding, presenting a new scale of industry challenges.
As all facilities accelerate production to address the chip shortage, how can the industry find new and revolutionary ways to meet the needs of new fabs and to accelerate the time to market? A new business environment is required to address challenges surrounding the design, build, and magnitude of advanced facilities, whilst continuing to tackle the complexity of advanced devices. Moving forward, facility owners will need to address enormous energy needs, increased water use, increased chemicals, whilst also recovering from the stress of the supply chain caused by the pandemic. Methods used to manage legacy fabs in the past will no longer be enough. It is more important than ever that the sector collaborates to create a seamless and sustainable future for the industry.Submit your abstract here.