Articles
Id | Year | Materials | Info | Company | Author | Tags | View |
---|---|---|---|---|---|---|---|
... | 2010 |
Please login or subscribe to view UPM Resources. |
Part 3: Performance of Polymers, Phosphonates, and Polymer/ Phosphonate Blends as Gypsum Scale InhibitorsSeveral operational issues in industrial water systems result due to the deposition of unwanted materials on equipment surfaces consisting of mineral scales, suspended matter, corrosion products and microbiological mass. This article examines the performance of synthetic polymers and phosphonates as gypsum scale inhibitors. Inhibitory data on the performance of polymer/phosphonate blends as gypsum precipitation inhibitors is additionally displayed in this article.
|
Walsh University | Zahid Amjad | Gypsum; Membranes; Phosphonates | View |
... | 2010 |
Please login or subscribe to view UPM Resources. |
The Implications of Sorption on the Rejection of Pharmaceutical Products by NanofiltrationIt is critical to discover new safe sources of high-quality water in order to meet high levels of water demand. Advancements in membrane technology has permitted the recycling of wastewater by treating it to appropriate standards using techniques such as Reverse Osmosis (RO) and nanofiltration, however recent results have indicated these membrane techniques are permeable for specific, small trace organic contaminants which thus imposes risks to the environment as well as human health. This article presents a study that highlights the sorption tendencies of trace organic contaminants and how this impacts steady-state rejection.
|
Stanford University; Stanford University and Erler & Kalinowski Inc | Eva Steinle-Darling; Martin Reinhard | Deionization Water; Membranes; Nanofiltration; Organics | View |
... | 2010 |
Please login or subscribe to view UPM Resources. |
Electropositive Non-Woven Filter Media for the Production of High-Purity WaterThe focal point of this article is the protection of RO membranes used to produce feedwater for the deionization process.
|
Ahlstrom Filtration; Ahlstrom Transportation Filtration | Christine Stanfel; Rod Komlenic | Filtration; Fouling; Membranes; Pretreatment | View |
... | 2010 |
Please login or subscribe to view UPM Resources. |
BWA Moves to Develop Next Generation of Treatment ProductsThis article presents an interview of ULTRAPURE WATER (UPW) with Paul Turgeon, president and chief operating officer of BWA Water Additives since 2006. It features a discussion surrounding BWA Water Additives, a company providing speciality chemical water treatment products targeted for use in industrial water, membrane, thermal desalination, oilfield and numerous other applications.
|
Mike Henley; | Antiscalants; Desalination; Fouling; Markets | View | |
... | 2010 |
Please login or subscribe to view UPM Resources. |
Metrology and Analytical Technology a Reverse Osmosis (RO) UnitThe successful Metrology and Analytical Technology of a Reverse Osmosis (RO) (RO) unit is not time consuming, requiring only a few minutes per day per RO unitwhich can ultimately reduce the costs for the plant. This article reviews the three paramount tools for Metrology and Analytical Technology RO units.
|
David H. Pual Inc | Ed Turner | Membranes; Metrology and Analytical Technology; Reverse Osmosis (RO); Scaling | View |
... | 2010 |
Please login or subscribe to view UPM Resources. |
New Device for the Collection, and Elemental Identification of Sub-50-nm Particles in UPWThe manufacturing of semiconductor devices requires the strict control and identification of particles and elements within the particles which contaminate the ultrapure water used in their production. Regulations advise that particles must be smaller than one half of the line-width of the device geometry, however currently available optical particle counters are restricted to measuring particles >40nm, therefore technology with the ability to identify elements within a particle <100nm does not currently exist. This article presents a new Metrology and Analytical Technology device intended to recognise contaminant elements in particles <50nm.
|
Fluid Measurement Technologies; Microfier | Art Ackermann; David Blackford; Glen Wildermuth; Sarah Schoen | Instruments; Measurement; Metrology and Analytical Technology; Particles | View |
... | 2010 |
Please login or subscribe to view UPM Resources. |
A Review of Challenges and Opportunities Facing the Water BusinessThis article discusses the emergence of new sectors within the global water industry and its rapid or consistent growth, including a review of key drivers impacting the water business.
|
TechKNOWLEDGE Strategic Group | Steve Maxwell | Forecast; Infrastructure; Markets | View |
... | 2010 |
Please login or subscribe to view UPM Resources. |
Part 2: Additional Research Needed to Update Water Specs for Evaporative CoolersThis article reviews numerous case studies which display the impact of progressively degraded makeup water quality on evaporative cooler (EC) operation. Case studies presented highlight the characteristics of an ideal makeup water for an EC and investigates the use of reclaimed water in an EC system.
|
CH2M Hill; Robinette Engineering | Charlie Nichols; Daniel J. Robinette | Cooling; Cooling Towers; Metrology and Analytical Technology; Power | View |
... | 2010 |
Please login or subscribe to view UPM Resources. |
Behaviour of Metal Deposition from High-Purity Water During Wafer Rinsing ProcessReducing semiconductor device size heightens the sensitivity to metal contamination with metal variations often effecting the device performance through different mechanisms. This article examines the metal deposition from ultrapure water, deionized water with low-part per trillion metal concentration and explains the results of this in terms of equilibrium adsorption of metal from deionized water.
|
IBM; GE Analytical Instruments; SUMCO USA | Drew Sinha; Jeff Chapman; Richard Godec | Cleaning; Deionised Water; materials of construction | View |
... | 2010 |
Please login or subscribe to view UPM Resources. |
Ozone can be a Cost-Effective Alternative to Heat or Chemical SanitizationA great challenge faced by ultrapure water (UPW) system operators is the frequent reappearance of bacterial contamination. An innovative method employed by leading semiconductor and pharmaceutical manufacturers attempts to tackle this challenge through the use of ozonation of water in the UPW system which is the strongest commercially available oxidizing agent for water disinfection. This article discusses total organic carbon reduction and passive microbial control using ozone and includes details on distribution loop sanitization.
|
MKS Instruments | Hands Sundstrom; Hossein Zarrin | sanitization; Semi-conductors | View |