Articles

Id Year Materials Info Company Author Tags View
... 2016
The use of EDI technology to recycle HF acid wastes from scrubbers and thermal treatment units
Electrodeionization (EDI) is one of the unit operations used to produce high-purity water. EDI can remove ionic contaminants from selected wastewater streams, so water can be recycled for reuse. This technology combined ion exchange (IX) and electrodialysis in a single cell.
Edwards Vacuum Adrienne Pierce; Benjamin Roberts; Chris Jones Electrodeionization (EDI); Wastewater; Ion Exchange View
... 2016
An approach for copper and hydrogen peroxide removal from copper CMP and solar cell wastewater
The advent of copper in integrated circuits in semiconductor manufacturing in the late 1990s led to the need for an efficient, environmentally compliant way to remove copper from wastewater generated from copper mechanical planarization/polishing (CuCMP) processes. CuCMP chemistry involves oxide slurry solids, chelators and other components that complicate traditional precipitation wastewater treatment methods that create a waste solid (i.e., sludge) considered to be hazardous waste by federal and state environmental regulations.
Evoqua Water Technologies; Adam Redding; Christopher Riley; Michael Wismer Copper; Chemical Mechanical Planarization (CMP); Ion Exchange; Organic Contamination; Wastewater; Environmental Impact and Compliance View
... 2016
What are the purity requirements for microelectronics UPW piping/distribution systems?
The article's title asks about the purity requirements for high-purity distributions systems in microelectronics water systems. We will begin this Backgrounder article with a primer on the evolution of high-purity water piping materials
GEMU Valves Frank Patrick Biological Contamination; Distribution Systems; Particles; PFAS View
... 2016
How can preventative maintenance of filters ensure the highest quality UPW at the lowest cost of ownership?
UF even withstands episodic increase of particle numbers in the feed (e.g., caused by conditioning of ion-exchange resins) without negative effects for water quality and service lifetime. Such a particle challenge typically involves high concentrations of ~10-nanometer (nm) particles. On the other hand, current on-line particle counters approach their lower detection limit at about 10nm. Large numbers of particles nearby and below this limit remain undetected. Hence, the integrity of a UF membrane is essential to keep these small particles under control; it can hardly be evaluated by comparing particle counts upstream and downstream. Therefore, better test methods are needed to identify membrane damages, and to decide on service life and replacement of UF membranes.
Pall; Gerd Heser; Jochen Ruth; Filtration; Ion Exchange; Metrology and Analytical Technology; Particles View
... 2016
Can THM monitoring and removal be improved in high-purity water applications
In water treatment history, the problem of increased concentration of disinfection byproducts (DBPs) started to emerge in the early 1900s. This is when chlorine (and ozone) started to be applied as primary disinfection agents for drinking water. A reaction of the disinfection agent with organic compounds present in water often leads to the formation of various types of DBPs. Throughout the years, with a growth in awareness around the negative impacts of DBPs on human health, previously underutilized DBP removal technologies gained importance while new ones have also been developed.
Ovivo; Philippe Rychen; John Degenova; Malek Salamor; Ignacy Kieler Activated Carbon; Chlorine; Metrology and Analytical Technology; Organic Contamination; Total Organic Carbon (TOC) View
... 2016
Achieving IPA removal in UPW from marangoni dryers in semiconductor production
Drying of rinse water from parts is, for many process engineers, a final critical step of a process. Drying steps can be costly, energy and time consuming, and if not done properly will leave a non-volatile residue of minerals, detergents, and ions on the surface of the part - not to mention water stains. There are various methods of drying that may be employed; however, one of the best approaches is Marangoni drying for flat surfaces such as semiconductor wafers or disk drives.
Exergy Systems; Neo-Tech Aqua Solutions Azita Yazdani; George Diefenthal Ultrapure Water; Isopropyl Alcohol (IPA); Ultraviolet (UV); Total Organic Carbon (TOC) View
... 2017
How to streamline wastewater treatment systems and make money out of waste
Semiconductor device manufacturing generates large quantities of solid, liquid and gaseous waste. A semiconductor fab is more or less a chemical plant that discharges wastewater streams with rather complex but well defined compositions. Different from chemical plants, however, process changes happen more frequently. The wastewater treatment technology of a semi fab is a moving target as sophisticated processes need advancing, more complex additives and materials.
Pall; Jochen Ruth; Gerd Heser; Wastewater; Chemical Mechanical Planarization (CMP); Membranes; Membrane Filtration View
... 2017
Can advanced oxidation technology help control TOC in semiconductor water?
This article will discuss typical organic removal methods commonly applied in a semiconductor ultrapure water (UPW*) system and new methods for improving the removal of organic contaminants from the critical process water. An equipment manufacturer has developed an advanced oxidation processes that specifically addresses total organic carbon (TOC) levels, to reduce them to sub-part-per-billion (ppb) levels. This has been shown to have significant benefits in the integrated chip (IC) manufacturing process
Evoqua Water Technologies; Alan Knapp; Glen Sundstrom; Bruce Coulter Total Organic Carbon (TOC); Advanced Oxidation View
... 2019
Industry Collaboration and SEMI Standards to enable IC manufacturing for advanced nodes
The complexity of integrated circuit (IC) manufacturing for advanced nodes, paired with the growing demand for higher yields and lower defectivity, requires close alignment among industry stakeholders. New systematic improvements of system design, material choice and quality assurance methodologies are needed to minimise every possible source of contamination and variation in the manufacturing process. An extensive collaborative effort between SEMI Standards Task Forces and IRDS roadmap teams, representing the IC manufacturing supply chain, is focused on developing industry best practices to enable proactive yield management. As a result, relevant SEMI Standards are being revised to focus on the quality of UPW and liquid chemicals, design and operation of related systems, qualification of polymer assemblies and process critical materials and components. This article was originally published in the Ultrapure Micro Journal in March 2019.
GF Piping Systems; SEMI Bob McIntosh; SEMI Particles; High Purity Chemicals; SEMI; UPW System View
... 2017
Review of Nanoparticles in Ultrapure Water
Ultrapure water (UPW) is one of the main materials for electronics fabrication and therefore, it needs to be monitored for critical parameters such as nanoparticles (NP). The state-of-the-art online measurement techniques are challenged by particles at the killer particle sizes smaller than 10 nm. Due to the uncertainties in NP detection, the identification of NP sources and sinks in UPW system is limited nowadays. This review article aims to give an overview on the current developments and perspectives in metrologies for detection and control. The following topics will be discussed: transferability of general definition of NP to UPW, state-of-the-art particle analytics, sources and sinks of NP in UPW systems as well as dominant particle interactions responsible for NP contamination. This article was originally published in the Ultrapure Micro Journal in November 2017.
Ovivo; Pia Herrling; Philippe Rychen; Metrology and Analytical Technology; Nanoparticles; Particles View