A New Approach for Metal Ion Purification to Meet the Needs of Trace Metal Reduction for 10 nm Node and Beyond

Date Published 2018 | Conference materials

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This presentation was given at the Ultrapure Micro 2018 annual conference. It was presented in the Ultra High Performance Chemicals and High Purity Gases track, as part of the High Purity Chemicals in Semiconductor Manufacturing session.

Organizations: 3M
Authors: Robert Gieger,
Tags: Ion ExchangeHigh Purity ChemicalsMetal Contamination

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