Achieving IPA removal in UPW from marangoni dryers in semiconductor production

Date Published 2016 | UPW journal archive

Log in or Join UltraFacility to access this content

To access our resources you will need to be a member of UltraFacility, log in to your account or purchase a membership to view this content.

Already have an account? Log in

Drying of rinse water from parts is, for many process engineers, a final critical step of a process. Drying steps can be costly, energy and time consuming, and if not done properly will leave a non-volatile residue of minerals, detergents, and ions on the surface of the part - not to mention water stains. There are various methods of drying that may be employed; however, one of the best approaches is Marangoni drying for flat surfaces such as semiconductor wafers or disk drives.

Organizations: Exergy Systems
Tags: Ultrapure WaterTotal Organic Carbon (TOC)Isopropyl Alcohol (IPA)Ultraviolet (UV)

Related content

UPW journal archive | 2017
Can advanced oxidation technology help control TOC in semiconductor water?
Learning series | 2018
End-of-Pipe Semiconductor Wastewater Reclaim
Conference material | 2022
What is Known About Urea Control in UPW Systems?​
Conference material | 2018
U-PURTM – A Metal-Free Combination of Several UPW Polishing Steps in a Multifunctional Reactor for the Removal of TOC and H2O2 Traces

Back to results

Not an UltraFacility Member?

Be part of year-round collaboration and knowledge exchange. Get access to the full range of tools leveraged by facility representatives and leading global experts from across the supply chain.

Book a demo

Find out how you can leverage UltraFacility Portal to achieve your business objectives today.

Request a demo