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2022 |
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Measurement of Particle Concentration and Wafer Defects during Ion Exchange Resin Rinse
Critical feature sizes of modern semiconductor devices have surpassed the capabilities of traditional optical-based methods to measure particle concentrations in process chemicals and on wafers. Without adequate metrology for quantifying particle and particle precursor concentration in process chemicals, device makers face challenges correlating component failures and fabrication steps. This is especially true for organic material released by Final Polish Ion Exchange resin during a rinse cycle, which is not detected efficiently using optical methods. In this work, we describe two state-of-the-art measurement methods that can detect organic particles and particle precursors to 3 nm using Aerosolization and Threshold Particle Counting (TPC) and defects from UPW deposited on a wafer surface down to 8 nm using Surfaced Enhanced Particle Sizing (SEPS)
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Kanomax FMT;
UNISERS;
CT Associates;
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Derek Oberreit;
Ali Altun;
Gary van Schooneveld;
Hans Mizusugi, Siqin He
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Ion Exchange; Facility 2.0; Particle Count and Detection; Metrology and Analytical Technology; UPW |
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2021 |
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High throughput online VPD-ICPMS for automated determination of metal contaminants on process wafers
This presentation was given as part of the Ultrapure Micro 2021 annual conference. It was given as part of the combined track, which contained presentations on airborne molecular contamination (AMC) and high purity gases, and ultra high purity chemicals.
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Elemental Scientific;
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Kyle Uhlmeyer;
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Metrology and Analytical Technology; Metal Contamination; Particle Count and Detection |
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2020 |
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Contamination Control in Liquid Chemicals - Q&A
This Q&A session took place at the 2020 Ultrapure Micro annual conference. It was a part of the AMC, Liquid Chemicals & Gases Control track, and included speakers from the Contamination Control in Liquid Chemicals session.
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ChemTrace;
Mega Fluid Systems; Versum
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Tom Bzik;
Michael Perkins; Mohsina Islam; Suhas Ketkar
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High Purity Chemicals; Distribution Systems; Metal Contamination; Metrology and Analytical Technology |
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2020 |
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Method Development for Trace Impurities in Novel Sub-nm Photoresists by Inductively Coupled Plasma Mass Spectrometry (ICP-MS)
This presentation was given at the Ultrapure Micro 2020 annual conference. It was presented in the AMC, Liquid Chemicals & Gases Control track, as part of the Contamination Control in Liquid Chemicals session.
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ChemTrace;
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Elizabeth Appiah; Linh Nguyen; Mohsina Islam; Peng Sun
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Metrology and Analytical Technology; Metal Contamination; Ultraviolet (UV) |
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2019 |
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Quantitative ICP-MS Analysis of High-k ALD Precursors for Trace Elemental Impurities
This presentation was given at the Ultrapure Micro 2019 annual conference. It was presented in the Ultra High Performance Chemicals and High Purity Gases track, as part of the High Purity Gases & Precursors session.
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Air Liquide;
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Jinjin Wang;
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Metrology and Analytical Technology; Metal Contamination; Organic Contamination |
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2019 |
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Optimized Combination of Cationic and Anionic Ion Exchange Resins for the Removal of Trace Amount of Metal Impurities from Isopropyl Alcohol
This presentation was given at the Ultrapure Micro 2019 annual conference. It was presented in the Ultra High Performance Chemicals and High Purity Gases track, as part of the Onsite Purification session.
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Organo;
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Noriko Hisano;
Yui Shioya;
Yasuhiro Yoshimura;
Haruo Yokota
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Metrology and Analytical Technology; Ion Exchange; Metal Contamination; Isopropyl Alcohol (IPA) |
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2019 |
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Productive and Analytical Technologies of pg/L (ppq) Grade Metals in UPW
This presentation was given at the Ultrapure Micro 2019 annual conference. It was presented in the Ultrapure Water Production track, as part of the Analytical session.
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Kurita Water Industries;
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Daiki Naganuma; Nobuhiro Tsuruma; Toshimasa Kato; Yasuharu Minato
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Metal Contamination; Metrology and Analytical Technology; UPW Polishing; Ion Exchange |
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2018 |
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Purification Method for High Purity PGMEA Using Ion Exchange Resins and Analysis of High Sensitive Trace Metals by ICP-MS
This presentation was given at the Ultrapure Micro 2018 annual conference. It was presented in the Ultra High Performance Chemicals and High Purity Gases track, as part of the High Purity Chemicals in Semiconductor Manufacturing session.
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Organo;
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Yasuhiro Yoshimura;
Noriko Hisano;
Akira Nakamura; Haruo Yokota; Miwa Ito
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Metrology and Analytical Technology; Ion Exchange; Metal Contamination; High Purity Chemicals |
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2018 |
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Case Study for Copper Wastewater Analysis - Direct Voltammetry
This presentation was given at the Ultrapure Micro 2018 annual conference. It was presented in the Water Management and Wastewater Treatment track, as part of the Analytical Water Management for Semiconductor Industry session.
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Aqua Metrology Systems;
Samsung Austin Semiconductor;
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Mike Knapp;
Vladimir Dozortsev
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End-user; Case Study; Copper; Metal Contamination; Metrology and Analytical Technology |
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2015 |
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Potential for On-Line Elemental Analysis of Ultra Pure Water Using an XRF Based Approach
This presentation was given at the Ultrapure Micro 2015 annual conference. It was presented in the Ultrapure Water Production track, as part of the UPW Technology Needs) session.
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Cooper Environmental Services
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Krag Petterson
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Metrology and Analytical Technology; Metal Contamination; Silica |
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