Copper and Hydrogen Peroxide (H2O2) Removal from Copper CMP & Solar Cell Wastewater

Date published: 2016

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This presentation was given at the Ultrapure Micro 2016 annual conference. It was presented in the Water Management and Wastewater Treatment track, as part of the Cu Treatment and Water Management session.

Companies: Evoqua Water Technologies;

Tags: Copper; Hydrogen Peroxide (H2O2); Chemical Mechanical Planarization (CMP); Ion Exchange; Metal Contamination