Organic contamination present in Ultrapure Water (UPW) and other liquids pose a risk of depositing on the wafer surface during processing and cleaning. Of greatest concern are those deposits that are non-volatile. These are designated as “Critical Organics”. The objectives of this study are to quantify the extraction of critical organics from high-purity piping in hot UPW; specifically, PFA and PVDF, assess the affinity of the organic contaminants to the wafer surface during spin processing and to determine the relative concentrations of organic contamination remaining on the wafer surface as a function of temperature.