Empirical Model to Understand the Particle Removal Behavior During Bulk Chemical Filtration

Date published: 2018

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This presentation was given at the Ultrapure Micro 2018 annual conference. It was presented in the Ultra High Performance Chemicals and High Purity Gases track, as part of the High Purity Chemicals in Semiconductor Manufacturing session.

Companies: Entegris;

Authors: Ashutosh Bhabhe; Tony Ozello; Kevin Seamster; Shannon Bradish; Ying Qi

Tags: Particle Removal; Bulk Chemical Filtration; Filtration; Retention; Cost of Ownership (COO); Modeling