Date Published 2014 | UPW journal archive
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Major steps are being taken towards meeting the on-line trace contaminant sensitivity required in microelectronics manufacturing involving improvements in resistivity measurements through better calibration capacity using ultrapure water as the standard combined with intelligent digital sensors technology ensuring accuracy in the water system and related processes. This article provides an update of recent advancements in resistivity Metrology and Analytical Technology and calibration to achieve high sensitivity.