Functional water solutions to enable advanced wet cleaning process for next-generation semiconductor device manufacturing
Date Published 2021 | Conference materials
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This presentation was given as part of the Ultrapure Micro 2021 annual conference. It was given as part of the ultrapure water strand.
Authors: Hideaki Iino, Yusuke Oniki, Efrain Altamirano-Sanchez, Frank Holsteyns, Yuya Akanishi, Shota Iwahata,
Tags: CopperScaling and CorrosionFoulingMetal Contamination
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