High throughput online VPD-ICPMS for automated determination of metal contaminants on process wafers

Date published: 2021

This presentation was given as part of the Ultrapure Micro 2021 annual conference. It was given as part of the combined track, which contained presentations on airborne molecular contamination (AMC) and high purity gases, and ultra high purity chemicals.

Companies: Elemental Scientific;

Authors: Kyle Uhlmeyer;

Tags: Metrology and Analytical Technology; Metal Contamination; Particle Count and Detection

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