Measurement and Modeling of TOC and Fluorine Ion Extraction from Polymeric Piping in Hot Ultrapure Water

The design of the UPW distribution system directly impacts the capacity required in the polish plant, as well as the performance and reliability of steady pressure control. Implementation of end-of-return pressure control is a well demonstrated tool for capacity and reliability management, but its benefits and limits must be quantified. Where previous fabs may have had just one end-of-supply or end-of-main pressure control valve, new fabs often have two or more. Multiple zones or submains require methodical management of risk where many control valves are in play.

The article's title asks about the purity requirements for high-purity distributions systems in microelectronics water systems. We will begin this Backgrounder article with a primer on the evolution of high-purity water piping materials

This presentation was given as part of the Ultrapure Micro 2021 annual conference. It was given as part of the ultrapure water strand.

The complexity of integrated circuit (IC) manufacturing for advanced nodes, paired with the growing demand for higher yields and lower defectivity, requires close alignment among industry stakeholders. New systematic improvements of system design, material choice and quality assurance methodologies are needed to minimise every possible source of contamination and variation in the manufacturing process. An extensive collaborative effort between SEMI Standards Task Forces and IRDS roadmap teams, representing the IC manufacturing supply chain, is focused on developing industry best practices to enable proactive yield management. As a result, relevant SEMI Standards are being revised to focus on the quality of UPW and liquid chemicals, design and operation of related systems, qualification of polymer assemblies and process critical materials and components. This article was originally published in the Ultrapure Micro Journal in March 2019.

In recent years, with the development of the semiconductor manufacturing process, ultrapure water (UPW) used to wash semiconductor devices have required high purity. In particular, particles in UPW are strictly controlled. Our 10 nm SEM analysis can measure 10 nm particles, which was previously impossible. This article presents the results of measuring 10 nm particles in the existing ultrapure water system. We clarified the behaviour (including generation sources and compositions) of 10 nm particles in ultrapure water systems in order to optimize and enhance. This article was originally published in the Ultrapure Micro Journal in November 2017.

This Q&A session took place at the 2020 Ultrapure Micro annual conference. It was a part of the Ultrapure Water Production track, and and included speakers from the UPW and Liquid Chemicals System Improvements session.

This presentation was given at the Ultrapure Micro 2020 annual conference. It was presented in the Ultrapure Water Production track, as part of the UPW Process Optimization session.

This presentation was given at the Ultrapure Micro 2019 annual conference. It was presented during the Learning Series, as part of the Ultrapure Water Production track.

This presentation was given at the Ultrapure Micro 2019 annual conference. It was presented during the Learning Series, as part of the Ultrapure Water Production track.

This presentation was given at the Ultrapure Micro 2018 annual conference. It was presented during the Learning Series, as part of the Ultrapure Water Production track.