Method Development for Trace Impurities in Novel Sub-nm Photoresists by Inductively Coupled Plasma Mass Spectrometry (ICP-MS)

Despite the technological advancements in online analytical metrologies for ultrapure water (UPW) quality monitoring, offline measurements of grab samples are critical to assess certain quality parameters to date not yet available for online analyzers (i.e. metals and ions). The current recommendations from IRDS (2021 yield enhancement) for metals in UPW to is <1 ppt, for critical metals for image sensors even <0.2 ppt at POP. Therefore, high performance analytics is required in terms of limit of quantification and analytical range. To be able to reliably measure such low concentrations of metals in grab samples, clean sampling strategies are absolutely required to avoid cross contamination onsite. In this work, we present a simple and effective tool helping to bring the samples from the facility to the lab in a clean and reliable way, minimizing main cross-contamination normally occurring during sampling in an industrial environment.

This presentation was given as part of the Ultrapure Micro 2021 annual conference. It was given as part of the combined track, which contained presentations on airborne molecular contamination (AMC) and high purity gases, and ultra high purity chemicals.

This webinar features a presentation from Nabil Mistkawi, Samsung Austin Semiconductor, who identifies key technology requirements for wet chemicals and gases from an end user perspective. This was followed by an engaging discussion between tool OEM companies and end users, as they explored the contamination control needs of individual environments, showing where contamination impacts the process, thereby bringing together the supply chain with the clean room.

This Q&A session took place at the 2020 Ultrapure Micro annual conference. It was a part of the AMC, Liquid Chemicals & Gases Control track, and included speakers from the Contamination Control in Liquid Chemicals session.

This presentation was given at the Ultrapure Micro 2019 annual conference. It was presented in the Ultra High Performance Chemicals and High Purity Gases track, as part of the High Purity Gases & Precursors session.

This presentation was given at the Ultrapure Micro 2019 annual conference. It was presented in the Ultra High Performance Chemicals and High Purity Gases track, as part of the Onsite Purification session.

This presentation was given at the Ultrapure Micro 2018 annual conference. It was presented in the Ultra High Performance Chemicals and High Purity Gases track, as part of the High Purity Chemicals in Semiconductor Manufacturing session.

This presentation was given at the Ultrapure Micro 2018 annual conference. It was presented in the Water Management and Wastewater Treatment track, as part of the Analytical Water Management for Semiconductor Industry session.