Method Development for Trace Impurities in Novel Sub-nm Photoresists by Inductively Coupled Plasma Mass Spectrometry (ICP-MS)

Date published: 2020

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This presentation was given at the Ultrapure Micro 2020 annual conference. It was presented in the AMC, Liquid Chemicals & Gases Control track, as part of the Contamination Control in Liquid Chemicals session.

Companies: ChemTrace;

Tags: Metrology and Analytical Technology; Metal Contamination; Ultraviolet (UV)