Method Development for Trace Impurities in Novel Sub-nm Photoresists by Inductively Coupled Plasma Mass Spectrometry (ICP-MS)

This presentation was given as part of the Ultrapure Micro 2021 annual conference. It was given as part of the combined track, which contained presentations on airborne molecular contamination (AMC) and high purity gases, and ultra high purity chemicals.

A newly developed H2O2 monitoring method is capable of continuous measurement without using chemical reagents but catalase-resin instead. This technology also makes it possible to measure H2O2 that is generated in a UV-ox (ultraviolet oxidizer) without interference. This study was conducted to support an ultrapure water (UPW) polishing system, and to compare existing H2O2 monitoring procedures with the new technology. This article was originally published in the Ultrapure Micro Journal in February 2018.

This webinar features a presentation from Nabil Mistkawi, Samsung Austin Semiconductor, who identifies key technology requirements for wet chemicals and gases from an end user perspective. This was followed by an engaging discussion between tool OEM companies and end users, as they explored the contamination control needs of individual environments, showing where contamination impacts the process, thereby bringing together the supply chain with the clean room.

This Q&A session took place at the 2020 Ultrapure Micro annual conference. It was a part of the AMC, Liquid Chemicals & Gases Control track, and included speakers from the Contamination Control in Liquid Chemicals session.

This presentation was given at the Ultrapure Micro 2019 annual conference. It was presented in the Ultra High Performance Chemicals and High Purity Gases track, as part of the High Purity Gases & Precursors session.

This presentation was given at the Ultrapure Micro 2019 annual conference. It was presented in the Ultra High Performance Chemicals and High Purity Gases track, as part of the Onsite Purification session.

This presentation was given at the Ultrapure Micro 2019 annual conference. It was presented in the Ultrapure Water Production track, as part of the Analytical session.

This presentation was given at the Ultrapure Micro 2018 annual conference. It was presented in the Ultra High Performance Chemicals and High Purity Gases track, as part of the High Purity Chemicals in Semiconductor Manufacturing session.

This presentation was given at the Ultrapure Micro 2018 annual conference. It was presented in the Water Management and Wastewater Treatment track, as part of the Analytical Water Management for Semiconductor Industry session.

This presentation was given at the Ultrapure Micro 2017 annual conference. It was presented in the Ultrapure Water Production track, as part of the UPW System Optimization session.