Multiple High Purity Resins Qualification for UPW Systems:​ Reducing Supply Risk

Date published: 2019

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This presentation was given at the Ultrapure Micro 2019 annual conference. It was presented in the Ultrapure Water Production track, as part of the Analytical session.

Companies: Samsung Austin Semiconductor;

Authors: Varinder Malik; Gary Shrestha;

Tags: Ion Exchange (IX); Resins; SEMI C93; Enduser; Polishing