New Device for the Collection, and Elemental Identification of Sub-50-nm Particles in UPW
Date Published 2010 | UPW journal archive
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The manufacturing of semiconductor devices requires the strict control and identification of particles and elements within the particles which contaminate the ultrapure water used in their production. Regulations advise that particles must be smaller than one half of the line-width of the device geometry, however currently available optical particle counters are restricted to measuring particles >40nm, therefore technology with the ability to identify elements within a particle <100nm does not currently exist. This article presents a new Metrology and Analytical Technology device intended to recognise contaminant elements in particles <50nm.
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