PFAS: Upcoming Regulations and the SEMI Industry Response

An overview of PFAS definitions and the regulatory environment, as well as destruction technologies and capability gaps.

The semiconductor production process requires PFAS containing chemicals that are impossible to replace in the manufacturing of computer chips. As a result, PFAS is present in the plant's wastewater which is coming under increased scrutiny and potentially future NPDES wastewater permit limits. As a result, many wastewater systems will require additional treatment technologies in order to reduce total PFAS. The presentation shows how technologies remove PFAS, the challenges associated with treatment and be better equipped to plan for future sampling, testing, design, piloting and implementation.

The new focus on sustainability has created new momentum to reduce wastes. One area that has not been considered before is the re-use of UPW pipe. Can pipe that has been in service for ambient UPW be re-used for UPW service? That is can it be removed and re-installed for reuse?

The advent of copper in integrated circuits in semiconductor manufacturing in the late 1990s led to the need for an efficient, environmentally compliant way to remove copper from wastewater generated from copper mechanical planarization/polishing (CuCMP) processes. CuCMP chemistry involves oxide slurry solids, chelators and other components that complicate traditional precipitation wastewater treatment methods that create a waste solid (i.e., sludge) considered to be hazardous waste by federal and state environmental regulations.

The article's title asks about the purity requirements for high-purity distributions systems in microelectronics water systems. We will begin this Backgrounder article with a primer on the evolution of high-purity water piping materials

This presentation was given as part of the Ultrapure Micro 2021 annual conference. It was given as part of the combined track, which contained presentations on airborne molecular contamination (AMC) and high purity gases, and ultra high purity chemicals.

Water management at advanced facilities has become increasingly complex. The manufacture of the new generation of technologies has increased water demands and posed new challenges for internal and external infrastructure. This webinar focused on proactive solutions and strategies based on recent developments in SEMI Standards. The panel then discussed risk management, environmental compliance, reliability issues and data management for water management challenges.

This webinar brought together the perspectives of end-users, high purity polymer material experts, and POU treatment specialists, to present a holistic view of the risks associated with high purity materials and components. Archita Sengupta, Intel, and Bob McIntosh, Enviro-Energy Solutions, opened the discussion by identifying the key technology challenges associated with high purity liquid delivery systems. Followed by a panel discussion of industry experts, the webinar addressed potential solutions and proactive strategies for improving material quality and treatment solutions to ensure high manufacturing yield.

This webinar begins with Slava Libman, FTD Solutions, presenting the annual International Roadmap for Devices and Systems (IRDS) and SEMI Standards Update. Following the presentation we continue with a panel discussion exploring risk management, resilience, and sustainability within the industry. Using the IRDS roadmap as an outline, our expert panellists discuss the continuing need for making improvements to technological gaps and facilities’ environmental footprints, whilst building a secure and sustainable future for the industry.

This Q&A session took place at the 2020 Ultrapure Micro annual conference. It was a part of the Water Management and Wastewater Treatment track, and included speakers from the Water Management in Cooling Systems & Wastewater Treatment and Environmental Compliance session.