Purification Method for High Purity PGMEA Using Ion Exchange Resins and Analysis of High Sensitive Trace Metals by ICP-MS

Date published: 2018

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This presentation was given at the Ultrapure Micro 2018 annual conference. It was presented in the Ultra High Performance Chemicals and High Purity Gases track, as part of the High Purity Chemicals in Semiconductor Manufacturing session.

Companies: Organo;

Authors: Yasuhiro Yoshimura; Noriko Hisano; Akira Nakamura; Haruo Yokota; Miwa Ito

Tags: Metrology and Analytical Technology; Ion Exchange; Metal Contamination; High Purity Chemicals