Purification of Chemicals for Semiconductor Use by Ultra-Clean Ion Exchange Resins
Date Published 2018 | Conference materials
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This presentation was given at the Ultrapure Micro 2018 annual conference. It was presented in the Ultra High Performance Chemicals and High Purity Gases track, as part of the High Purity Chemicals in Semiconductor Manufacturing session.
Organizations: Organo
Authors: Akira Nakamura, Harau Yokotaand, Miwa Ito, Tags: Ion ExchangeMetal ContaminationHydrogen Peroxide (H2O2)Isopropyl Alcohol (IPA)
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