2022 |
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PFAS: Upcoming Regulations and the SEMI Industry Response
Presentation given at January 20th 2022 online UPM Community event.
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Chemours;
Intel;
Enviro-Energy Solutions;
Evoqua Water Technologies;
GHD;
GF Piping Systems;
Kinetics;
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Bob McIntosh;
Amber Wellman;
Kevin Wolfe;
Katrin Wallheinke;
Ryan Thomas;
Alan Knapp;
David Kandiyeli
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PFAS; Wastewater; Environmental Impact and Compliance; SEMI; Distribution Systems |
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2021 |
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Creating our resilient water future
This presentation was given as part of the Ultrapure Micro 2021 annual conference. It was given as a keynote presentation
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Alliance for Water Stewardship;
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Adrian Sym;
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Water Consumption and Conservation; Supply Chain; Risk Management; Environmental Impact and Compliance |
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2021 |
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300mm unpatterned wafer defect review and characterization with universal surface enhanced Raman spectroscopy
This presentation was given as part of the Ultrapure Micro 2021 annual conference. It was given as part of the ultra high purity chemicals strand.
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UNISERS;
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Ali Altun;
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Wafer Defectivity; Particle Precursors; Particle Count and Detection; IRDS |
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2021 |
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Enabling advanced semiconductor yield via proactive technology management
This presentation was given as part of the Ultrapure Micro 2021 annual conference. It was given as a keynote presentation
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FTD Solutions;
CT Associates;
Page;
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Slava Libman;
Gary van Schooneveld;
Dan Wilcox;
Bonnie Marion;
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IRDS; SEMI; Risk Management; Particle Precursors; Wafer Defectivity |
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2020 |
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Yield Enhancement in Wet Cleaning of Silicon Wafers by Critical Area Analysis
This presentation was given at the Ultrapure Micro 2020 annual conference. It was presented in the Ultrapure Water Production track, as part of the Wafer Contamination Control - Particles Monitoring session.
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FTD Solutions;
Sinha Solutions
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Slava Libman;
Drew Sinha
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Particle Count and Detection; IRDS; Wafer Defectivity |
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2020 |
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Removal of trace metals from Ultra Pure Water (UPW) using membrane-based solutions
This presentation was given at the Ultrapure Micro 2020 annual conference. It was presented in the Ultrapure Water Production track, as part of the UPW Contamination Control session.
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Entegris;
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Ashutosh Bhabhe;
Brant Kim; Jad Jaber; James Hamzik; Justin Brewster; Nathaniel Goff; Siddarth Sampath
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Metal Contamination; Silica; IRDS; SEMI; Filtration |
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2020 |
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Proactive Technology Management - Supply Chain in Support of Advanced Technology Yields
This webinar brought together the perspectives of end-users, high purity polymer material experts, and POU treatment specialists, to present a holistic view of the risks associated with high purity materials and components. Archita Sengupta, Intel, and Bob McIntosh, Enviro-Energy Solutions, opened the discussion by identifying the key technology challenges associated with high purity liquid delivery systems. Followed by a panel discussion of industry experts, the webinar addressed potential solutions and proactive strategies for improving material quality and treatment solutions to ensure high manufacturing yield.
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FTD Solutions;
Intel;
Enviro-Energy Solutions;
Entegris;
Pall;
Evoqua Water Technologies;
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Slava Libman;
Rushi Matkar;
Bob McIntosh;
Ashutosh Bhabhe;
Jochen Ruth;
Alan Knapp;
Archita Sengupta
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End-user; Supply Chain; Distribution Systems; Wafer Defectivity; IRDS; SEMI |
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2020 |
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Proactive Solutions in Water Management for Advanced Semiconductor Manufacturers
Water management at advanced facilities has become increasingly complex. The manufacture of the new generation of technologies has increased water demands and posed new challenges for internal and external infrastructure. This webinar focused on proactive solutions and strategies based on recent developments in SEMI Standards. The panel then discussed risk management, environmental compliance, reliability issues and data management for water management challenges.
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FTD Solutions;
Intel;
Ovivo;
Page;
Samsung Austin Semiconductor;
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Slava Libman;
Paul Kerr;
Alex Milshteen;
Philippe Rychen;
Dan Wilcox;
Michael Knapp;
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SEMI; Wastewater Reclamation and Reuse; PFAS; Environmental Impact and Compliance; Data Management |
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2019 |
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Understanding Particle Contribution from Components Used in Ultrapure Water and High-Purity Chemical Systems and Their Impact on Industry-Driven Particle Requirements
This presentation was given at the Ultrapure Micro 2019 annual conference. It was presented in the Ultra High Performance Chemicals and High Purity Gases track, as part of the High Performance Chemicals in Semiconductor Manufacturing session.
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CT Associates;
Enviro-Energy Solutions;
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Gary van Schooneveld;
Bob McIntosh;
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IRDS; SEMI; Particle Count and Detection; High Purity Chemicals; Distribution Systems; UPW System |
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2019 |
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Retention Efficiency for sub-30 nm Particles Quantitatively Measured by Single Particle Detection
This presentation was given at the Ultrapure Micro 2019 annual conference. It was presented in the Ultra High Performance Chemicals and High Purity Gases track, as part of the Nanoscale Analytical: PPW? session.
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3M;
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Charlie Chan; Daniel Lei; Jinsheng Zhou; Majid Entezarian; Robert Gieger
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Metrology and Analytical Technology; Nanoparticles; Particle Count and Detection; SEMI |
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