Substrate Environment Contamination Control - The Manufacturing Tools Perspective

Date Published 2020 | Seminars

Log in or Join UltraFacility to access this content

To access our resources you will need to be a member of UltraFacility, log in to your account or purchase a membership to view this content.

Already have an account? Log in

This webinar features a presentation from Nabil Mistkawi, Samsung Austin Semiconductor, who identifies key technology requirements for wet chemicals and gases from an end user perspective. This was followed by an engaging discussion between tool OEM companies and end users, as they explored the contamination control needs of individual environments, showing where contamination impacts the process, thereby bringing together the supply chain with the clean room.

Authors: Jim Snow,
Tags: Ultraviolet (UV)IRDSEnd-userWafer DefectivityMetrology and Analytical Technology

Related content

Conference material | 2018
Development of an Online Urea Monitor for Ultrapure Water Production in Semiconductor Fabrication Plants
Conference material | 2021
Risk centered asset management
Conference material | 2022
Multi-Species PPT-Level Impurity Detection in Electronic Bulk Gases Using Atmospheric Pressure Ionization Mass Spectrometry​
Conference material | 2015
THM – A Novel Sustainable Approach as a Global Solution for UPW Applications

Back to results

Not an UltraFacility Member?

Be part of year-round collaboration and knowledge exchange. Get access to the full range of tools leveraged by facility representatives and leading global experts from across the supply chain.

Book a demo

Find out how you can leverage UltraFacility Portal to achieve your business objectives today.

Request a demo