... |
2022 |
Please login or subscribe to view UPM Resources.
|
2022 IRDS & SEMI Standards Update
Enabling Advanced Semiconductor Yield via Proactive Technology Management - an overview of the IRDS research work and future roadmap, as well as SEMI standard and future focus areas.
|
CT Associates;
FTD Solutions;
Page;
|
Gary van Schooneveld;
Slava Libman;
Dan Wilcox;
|
SEMI; IRDS; Sustainability; Particle Precursors; Energy Conservation; Water Conservation |
View |
... |
2021 |
Please login or subscribe to view UPM Resources.
|
Enabling advanced semiconductor yield via proactive technology management
This presentation was given as part of the Ultrapure Micro 2021 annual conference. It was given as a keynote presentation
|
FTD Solutions;
CT Associates;
Page;
|
Slava Libman;
Gary van Schooneveld;
Dan Wilcox;
Bonnie Marion;
|
IRDS; SEMI; Risk Management; Particle Precursors; Wafer Defectivity |
View |
... |
2021 |
Please login or subscribe to view UPM Resources.
|
300mm unpatterned wafer defect review and characterization with universal surface enhanced Raman spectroscopy
This presentation was given as part of the Ultrapure Micro 2021 annual conference. It was given as part of the ultra high purity chemicals strand.
|
UNISERS;
|
Ali Altun;
|
Wafer Defectivity; Particle Precursors; Particle Count and Detection; IRDS |
View |
... |
2020 |
Please login or subscribe to view UPM Resources.
|
Proactive Technology Management - Supply Chain in Support of Advanced Technology Yields
This webinar brought together the perspectives of end-users, high purity polymer material experts, and POU treatment specialists, to present a holistic view of the risks associated with high purity materials and components. Archita Sengupta, Intel, and Bob McIntosh, Enviro-Energy Solutions, opened the discussion by identifying the key technology challenges associated with high purity liquid delivery systems. Followed by a panel discussion of industry experts, the webinar addressed potential solutions and proactive strategies for improving material quality and treatment solutions to ensure high manufacturing yield.
|
FTD Solutions;
Intel;
Enviro-Energy Solutions;
Pall;
Evoqua Water Technologies;
|
Slava Libman;
Rushi Matkar;
Bob McIntosh;
Ashutosh Bhabhe;
Jochen Ruth;
Alan Knapp;
Archita Sengupta
|
End-user; Supply Chain; Distribution Systems; Wafer Defectivity; IRDS; SEMI |
View |
... |
2020 |
Please login or subscribe to view UPM Resources.
|
Substrate Environment Contamination Control - The Manufacturing Tools Perspective
This webinar features a presentation from Nabil Mistkawi, Samsung Austin Semiconductor, who identifies key technology requirements for wet chemicals and gases from an end user perspective. This was followed by an engaging discussion between tool OEM companies and end users, as they explored the contamination control needs of individual environments, showing where contamination impacts the process, thereby bringing together the supply chain with the clean room.
|
ASML;
Samsung Austin Semiconductor;
SCREEN SPE;
Applied Materials;
Intel;
Page;
FTD Solutions;
SCREEN Holdings
|
James Snow;
Rushi Matkar;
Dan Wilcox;
Slava Libman;
Abbas Rastegar; Jim Snow; Marcel Teunissen; Nabil Mistkawi
|
IRDS; Metrology and Analytical Technology; Wafer Defectivity; End-user; Ultraviolet (UV) |
View |
... |
2020 |
Please login or subscribe to view UPM Resources.
|
Yield Enhancement in Wet Cleaning of Silicon Wafers by Critical Area Analysis
This presentation was given at the Ultrapure Micro 2020 annual conference. It was presented in the Ultrapure Water Production track, as part of the Wafer Contamination Control - Particles Monitoring session.
|
FTD Solutions;
Sinha Solutions
|
Slava Libman;
Drew Sinha
|
Particle Count and Detection; IRDS; Wafer Defectivity |
View |
... |
2019 |
Please login or subscribe to view UPM Resources.
|
UPW IRDS and SEMI: Reinforced Process of Enabling Advanced Existing and Future Semiconductor Technologies
This presentation was given at the Ultrapure Micro 2019 annual conference. It was presented as a Keynote presentation.
|
FTD Solutions;
|
Slava Libman;
|
IRDS; SEMI; Particle Precursors; Distribution Systems; Particle Count and Detection |
View |