U-PURTM – A Metal-Free Combination of Several UPW Polishing Steps in a Multifunctional Reactor for the Removal of TOC and H2O2 Traces

Date published: 2018

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This presentation was given at the Ultrapure Micro 2018 annual conference. It was presented in the Ultrapure Water Production track, as part of the Solving Current UPW Challenges with Innovative Design Solutions session.

Companies: Ovivo; Applied University Furtwangen

Authors: Philippe Rychen; David Gaupp; Sylvain Keav; Thomas Oppenlaender

Tags: Total Organic Carbon (TOC); Hydrogen Peroxide (H2O2); UPW Polishing; Ion Exchange