Urea is chemical widely used as nitrogen fertilizer and feed supplement. It is nonvolatile, difficult to oxidize, non-ionic, and highly soluble in water and has a low molecular weight (60 g/mol). Conventional ultrapure water purification techniques are not able to remove it from UPW, and it is a common contaminant in every water reclaim system. Urea naturally decomposes into ammonia, that even at part per billion concentrations, may negatively impact the performance of the acid-catalyzed, chemically amplified photoresists used in today’s DUV photolithography processes. Due to the increasing demand for high quality UPW in the semiconductor industry with tight specs and need to promote water conservation, it is important to treat urea in UPW