Yield & Reliability Drivers and the Implications for Facility 2.0

Thursday April 07 2022 08:00-09:30 Pacific Time

The first community event will discuss the complexity of the advanced devices and the technology needs to enable quality output. The panel will discuss critical developments, including: growing demand for a greater range of devices with longer life expectancy and higher performance; 3D architectures and device complexity driving the need for micro-contamination control; digitization and data flow management changing the organization of facilities; and proactive quality management for higher performance treatment systems and high purity materials.

This online meeting will feature three short presentations from IRDS experts, followed by expert-led panel discussions, before finally concluding with a brainstorming of ideas in the networking roundtable session.
Confirmed speakers and roundtable topics:
  • Slava Libman, CEO, FTD Solutions
  • Dan Wilcox, Principal - Director Process Engineering, Page
  • Mustafa Badaroglu, Principal Engineer/Architect, Qualcomm
  • Supika Mashiro, EHS Strategy Planning and Standard Strategy Expert, Tokyo Electron

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