Company Profile

A discussion of how the production of new complex devices is causing complications for the construction and operation of huge new semiconductor facilities.

A discussion about semiconductor facilities’ environmental footprint in relation to water consumption, energy usage, and site selection considerations.

A discussion of how contamination and defectivity control might be done differently in the future, to enable advanced semiconductor yield.

This presentation was given as part of the Ultrapure Micro 2021 annual conference. It was given as part of the water and wastewater management strand.

This presentation was given as part of the Ultrapure Micro 2021 annual conference. It was given as part of the water and wastewater management strand.

This presentation was given as part of the Ultrapure Micro 2021 annual conference. It was given as part of the water and wastewater management strand.

This article provides an overview of the biggest challenge of UPW technology – particle control. The latest semiconductor technologies require near particle-free water, where the “killer” particle size is far below the size that UPW metrology can effectively detect. Also, current advanced treatment methods cannot guarantee reliable removal of killer-sized particles. The quality of the high-purity materials used downstream of the final filters has not typically been tested for shedding of the “killer” particles. Consequently, the semiconductor industry requires a comprehensive approach for the particle control. A new approach should include mitigating particle occurrence and continuously improving the technologies used in UPW polish and distribution systems. Such an approach should also include extensive use of SEMI standards to improve the quality of the materials used; a new way to engineer solutions related to system-configuration and system design; improved process control; and a careful review of critical operational decisions. Collaboration throughout the industry via IRDS and SEMI Standards is key to enabling such systematic improvement, and overcoming the metrology and other constraints. This article was originally published in the Ultrapure Micro Journal in November 2017.

Water management at advanced facilities has become increasingly complex. The manufacture of the new generation of technologies has increased water demands and posed new challenges for internal and external infrastructure. This webinar focused on proactive solutions and strategies based on recent developments in SEMI Standards. The panel then discussed risk management, environmental compliance, reliability issues and data management for water management challenges.

This webinar features a presentation from Nabil Mistkawi, Samsung Austin Semiconductor, who identifies key technology requirements for wet chemicals and gases from an end user perspective. This was followed by an engaging discussion between tool OEM companies and end users, as they explored the contamination control needs of individual environments, showing where contamination impacts the process, thereby bringing together the supply chain with the clean room.

This presentation was given at the Ultrapure Micro 2020 annual conference. It was presented in the AMC, Liquid Chemicals & Gases Control track, as part of the Airborne Molecular Contamination (AMC) and High Purity Gases Control session.