Find the webinar Q&A here: https://www.ultrapuremicro.com/insights/expert-q-a-driving-solutions-yield-and-reliability-solutions-in-the-semiconductor-industry 3D chip structures, heterogeneous integration, and smaller technology nodes mean that critical defect sizes are at single-digit nanometer scales. Consumer demand for longer-lasting chips also puts pressure on contamination control needs. Quality specifications are harder than ever to meet, and they will only become more stringent. Presented in this webinar is some of the most cutting-edge research related to yield enhancement for liquid chemicals and water.

Speakers from Samsung, Intel, SCREEN, and FTD Solutions speak about why the semiconductor industry's resource consumption is dramatically increasing, as well as the water-energy relationship and other interrelated priorities which impact decision-making about sustainability.

A discussion of how the production of new complex devices is causing complications for the construction and operation of huge new semiconductor facilities.

A discussion about semiconductor facilities’ environmental footprint in relation to water consumption, energy usage, and site selection considerations.

A discussion of how contamination and defectivity control might be done differently in the future, to enable advanced semiconductor yield.

Fabs may increase production capacity, which results in an increase in utility usage. As production increases, it may be difficult to complete capacity upgrades for compressed air equipment quickly enough due to equipment and construction lead times. Some systems begin to run out of redundancy. This presentation shows a case study for maintaining redundancy in order to perform proper maintenance and ensure provision of reliable compressed air to end users. The understanding of operational health of equipment is key catch problems before they cause any system impacts.

This provides greater visibility to the material manufacturing process, which complements a risk-based approach to material disposition and facilitates timely response to inline material signals. Gases have not historically resulted in the same level of fab process impact at legacy nodes; however, excursion impact of raw materials has increased exponentially at smaller and smaller nodes. More frequently, gas excursions have resulted from isolated process, raw material, and cylinder-level abnormalities not characterized on the COA. This impact has driven the need for a similar COA expansion approach within high purity gases, for quality assurance. In preparation for EUV nodes, the overall gap in analytical capability, characterization, and control between the Asian and US markets, further drives the need for this supply chain visibility. Therefore, investment and innovation in US high purity gas supply chains will be critical to achieving yield ramp in EUV nodes.

This presentation was given as part of the Ultrapure Micro 2021 annual conference. It was given as part of the water and wastewater management strand.

This presentation was given as part of the Ultrapure Micro 2021 annual conference. It was given as part of the water and wastewater management strand.

This presentation was given as part of the Ultrapure Micro 2021 annual conference. It was given as part of the water and wastewater management strand.