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2021 |
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Measurement of nanoparticles and their precursors
This presentation was given as part of the Ultrapure Micro 2021 annual conference. It was given as part of the airborne molecular contamination (AMC) and high purity gases control strand.
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Airmodus;
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Joonas Vanhanen;
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Airborne Molecular Contamination (AMC); Nanoparticles; Metrology and Analytical Technology; Particle Precursors; Particle Count and Detection |
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2021 |
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Nanoparticles characterisation for semiconductor UPW production system monitoring using ICP-MS
This presentation was given as part of the Ultrapure Micro 2021 annual conference. It was given as part of the ultrapure water strand.
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Air Liquide;
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Jinjin Wang;
Fuhe Li
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Nanoparticles; UPW System; Metrology and Analytical Technology; Particle Count and Detection |
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2017 |
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Review of Nanoparticles in Ultrapure Water
Ultrapure water (UPW) is one of the main materials for electronics fabrication and therefore, it needs to be monitored for critical parameters such as nanoparticles (NP). The state-of-the-art online measurement techniques are challenged by particles at the killer particle sizes smaller than 10 nm. Due to the uncertainties in NP detection, the identification of NP sources and sinks in UPW system is limited nowadays. This review article aims to give an overview on the current developments and perspectives in metrologies for detection and control. The following topics will be discussed: transferability of general definition of NP to UPW, state-of-the-art particle analytics, sources and sinks of NP in UPW systems as well as dominant particle interactions responsible for NP contamination. This article was originally published in the Ultrapure Micro Journal in November 2017.
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Ovivo;
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Pia Herrling;
Philippe Rychen;
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Metrology and Analytical Technology; Nanoparticles; Particles |
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2020 |
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UPW Process Optimization - Q&A
This Q&A session took place at the 2020 Ultrapure Micro annual conference. It was a part of the Ultrapure Water Production track, and included speakers from the UPW Process Optimization session.
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3M;
FTD Solutions;
Ovivo;
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Gil Maron;
Pia Herrling;
Charlie Chan
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Metrology and Analytical Technology; Nanoparticles; Membranes; Ion Exchange; UPW Polishing |
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2020 |
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Understanding Nanoparticle Contamination in Ultrapure Water Generation and Distribution
This presentation was given at the Ultrapure Micro 2020 annual conference. It was presented in the Ultrapure Water Production track, as part of the UPW Contamination Control session.
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Intel;
Particle Measuring Systems;
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Glen Slayter;
Dan Rodier;
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End-user; Nanoparticles; Particle Count and Detection; Metrology and Analytical Technology; Case Study; UPW Polishing |
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2020 |
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Can Nanoparticles penetrate UPW polishing resins? Nanoscale particle interactions by high resolution imaging of single resin beads
This presentation was given at the Ultrapure Micro 2020 annual conference. It was presented in the Ultrapure Water Production track, as part of the UPW Process Optimization session.
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Ovivo;
Karlsruhe Institute of Technology
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Pia Herrling;
Philippe Rychen;
Eva Mayrose; Gisela Guthausen
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Nanoparticles; UPW Polishing; Ion Exchange; Metrology and Analytical Technology |
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2020 |
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Determine functional pore sizes of ultrafiltration membranes by nanoparticle retention test using single particle ICP-MS
This presentation was given at the Ultrapure Micro 2020 annual conference. It was presented in the Ultrapure Water Production track, as part of the UPW Process Optimization session.
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3M;
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Charlie Chan; Jinseng Zhou; Majid Entezarian; Robert Gieger
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Nanoparticles; Membranes; Metrology and Analytical Technology |
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2019 |
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Advanced Microscopy for Quantification and Identification in UPW, Process Chemicals, and Industrial Gases
This presentation was given at the Ultrapure Micro 2019 annual conference. It was presented in the Ultra High Performance Chemicals and High Purity Gases track, as part of the Nanoscale Analytical: PPW? session.
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Air Liquide;
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Fang Li;
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Nanoparticles; Metrology and Analytical Technology; Filtration; Particle Count and Detection; High Purity Gases |
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2019 |
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Retention Efficiency for sub-30 nm Particles Quantitatively Measured by Single Particle Detection
This presentation was given at the Ultrapure Micro 2019 annual conference. It was presented in the Ultra High Performance Chemicals and High Purity Gases track, as part of the Nanoscale Analytical: PPW? session.
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3M;
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Charlie Chan; Daniel Lei; Jinsheng Zhou; Majid Entezarian; Robert Gieger
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Metrology and Analytical Technology; Nanoparticles; Particle Count and Detection; SEMI |
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2019 |
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A Novel ICP-MS Metrology for Analysis of Nanoparticles in UPW
This presentation was given at the Ultrapure Micro 2019 annual conference. It was presented in the Ultrapure Water Production track, as part of the UPW Analytical Methods and Techniques session.
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Air Liquide;
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Jinjin Wang;
Fuhe Li; Lisa Mey-Ami
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Metrology and Analytical Technology; Nanoparticles; IRDS |
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