We have begun to release some of the NextGen UPM site! Head over to our new Technical Knowledge Base to browse our UPM resources, or map the ultrapure water value chain using our updated EcoSystem!

Benchmarking the particle removal performance of ultrafiltration modules in UPW using several particle metrologies​

Date published: 2022

Please login or subscribe to view UPM Resources.

Nanoparticles represent one of the most critical contaminations in ultrapure supplies for semiconductor fabrication addressing ultrapure water (UPW), gasses and chemicals as well as materials of construction decreasing yield on the wafer. Along the UPW generation process, there are sources (e.g. materials) and sinks (e.g. filter) for nanoparticles. As final barrier for nanoparticles in the polishing step, ultrafilters are commonly used on UPW plants. However, the performance of the ultrafilters in the field in terms of removal performance for particles need to be investigated to come up with pro-active approaches for particle removal. Especially for UPW, there is a lack of online particle metrologies down to particle size of sub 50 nm. This study aims to give an overview on different particle metrologies to better understand the particle removal performance by ultrafilters on the market.

Companies: Ovivo;

Authors: Pia Herrling; Philippe Rychen; Najib Alia;

Tags: Nanoparticles; Critical Contamination; Ultrapure Water; materials of construction; Metrology and Analytical Technology

Related resources

Apply
Id Year Materials Info Company Author Tags View
... 2021

Please login or subscribe to view UPM Resources.
Measurement of nanoparticles and their precursors
This presentation was given as part of the Ultrapure Micro 2021 annual conference. It was given as part of the airborne molecular contamination (AMC) and high purity gases control strand.
 Airmodus; Joonas Vanhanen; Airborne Molecular Contamination (AMC); Nanoparticles; Metrology and Analytical Technology; Particle Precursors; Particle Count and Detection View
... 2021

Please login or subscribe to view UPM Resources.
Nanoparticles characterisation for semiconductor UPW production system monitoring using ICP-MS
This presentation was given as part of the Ultrapure Micro 2021 annual conference. It was given as part of the ultrapure water strand.
 Air Liquide; Jinjin Wang; Fuhe Li Nanoparticles; UPW System; Metrology and Analytical Technology; Particle Count and Detection View
... 2017

Please login or subscribe to view UPM Resources.
Review of Nanoparticles in Ultrapure Water
Ultrapure water (UPW) is one of the main materials for electronics fabrication and therefore, it needs to be monitored for critical parameters such as nanoparticles (NP). The state-of-the-art online measurement techniques are challenged by particles at the killer particle sizes smaller than 10 nm. Due to the uncertainties in NP detection, the identification of NP sources and sinks in UPW system is limited nowadays. This review article aims to give an overview on the current developments and perspectives in metrologies for detection and control. The following topics will be discussed: transferability of general definition of NP to UPW, state-of-the-art particle analytics, sources and sinks of NP in UPW systems as well as dominant particle interactions responsible for NP contamination. This article was originally published in the Ultrapure Micro Journal in November 2017.
 Ovivo; Pia Herrling; Philippe Rychen; Metrology and Analytical Technology; Nanoparticles; Particles View
... 2020

Please login or subscribe to view UPM Resources.
UPW Process Optimization - Q&A
This Q&A session took place at the 2020 Ultrapure Micro annual conference. It was a part of the Ultrapure Water Production track, and included speakers from the UPW Process Optimization session.
 3M; FTD Solutions; Ovivo; Gil Maron; Pia Herrling; Charlie Chan Metrology and Analytical Technology; Nanoparticles; Membranes; Ion Exchange; UPW Polishing View
... 2020

Please login or subscribe to view UPM Resources.
Understanding Nanoparticle Contamination in Ultrapure Water Generation and Distribution
This presentation was given at the Ultrapure Micro 2020 annual conference. It was presented in the Ultrapure Water Production track, as part of the UPW Contamination Control session.
Intel; Particle Measuring Systems; Glen Slayter; Dan Rodier; End-user; Nanoparticles; Particle Count and Detection; Metrology and Analytical Technology; Case Study; UPW Polishing View
... 2020

Please login or subscribe to view UPM Resources.
Can Nanoparticles penetrate UPW polishing resins? Nanoscale particle interactions by high resolution imaging of single resin beads
This presentation was given at the Ultrapure Micro 2020 annual conference. It was presented in the Ultrapure Water Production track, as part of the UPW Process Optimization session.
 Ovivo; Karlsruhe Institute of Technology Pia Herrling; Philippe Rychen; Eva Mayrose; Gisela Guthausen Nanoparticles; UPW Polishing; Ion Exchange; Metrology and Analytical Technology View
... 2020

Please login or subscribe to view UPM Resources.
Determine functional pore sizes of ultrafiltration membranes by nanoparticle retention test using single particle ICP-MS
This presentation was given at the Ultrapure Micro 2020 annual conference. It was presented in the Ultrapure Water Production track, as part of the UPW Process Optimization session.
 3M; Charlie Chan; Jinseng Zhou; Majid Entezarian; Robert Gieger Nanoparticles; Membranes; Metrology and Analytical Technology View
... 2019

Please login or subscribe to view UPM Resources.
Advanced Microscopy for Quantification and Identification in UPW, Process Chemicals, and Industrial Gases
This presentation was given at the Ultrapure Micro 2019 annual conference. It was presented in the Ultra High Performance Chemicals and High Purity Gases track, as part of the Nanoscale Analytical: PPW? session.
 Air Liquide; Fang Li; Nanoparticles; Metrology and Analytical Technology; Filtration; Particle Count and Detection; High Purity Gases View
... 2019

Please login or subscribe to view UPM Resources.
Retention Efficiency for sub-30 nm Particles Quantitatively Measured by Single Particle Detection
This presentation was given at the Ultrapure Micro 2019 annual conference. It was presented in the Ultra High Performance Chemicals and High Purity Gases track, as part of the Nanoscale Analytical: PPW? session.
 3M; Charlie Chan; Daniel Lei; Jinsheng Zhou; Majid Entezarian; Robert Gieger Metrology and Analytical Technology; Nanoparticles; Particle Count and Detection; SEMI View
... 2019

Please login or subscribe to view UPM Resources.
A Novel ICP-MS Metrology for Analysis of Nanoparticles in UPW​
This presentation was given at the Ultrapure Micro 2019 annual conference. It was presented in the Ultrapure Water Production track, as part of the UPW Analytical Methods and Techniques session.
 Air Liquide; Jinjin Wang; Fuhe Li; Lisa Mey-Ami Metrology and Analytical Technology; Nanoparticles; IRDS View