Contamination in Formulated Chemistries – How Can Filtration Enable Next Generation Semiconductor Processes?
Date published: 2019
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This presentation was given at the Ultrapure Micro 2019 annual conference. It was presented in the Ultra High Performance Chemicals and High Purity Gases track, as part of the High Performance Chemicals in Semiconductor Manufacturing session.
Companies: Entegris;
Authors: Ashutosh Bhabhe; Jennifer Braggin; Thomas Phely-Bobin
Tags: Wet Clean; Photolithography; Membrane Customization; Membranes; Ultra High Molecular Weight Polyethylene; Filtration
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