Enabling advanced semiconductor yield via proactive technology management

Enabling Advanced Semiconductor Yield via Proactive Technology Management - an overview of the IRDS research work and future roadmap, as well as SEMI standard and future focus areas.

This presentation was given as part of the Ultrapure Micro 2021 annual conference. It was given as part of the ultra high purity chemicals strand.

This webinar brought together the perspectives of end-users, high purity polymer material experts, and POU treatment specialists, to present a holistic view of the risks associated with high purity materials and components. Archita Sengupta, Intel, and Bob McIntosh, Enviro-Energy Solutions, opened the discussion by identifying the key technology challenges associated with high purity liquid delivery systems. Followed by a panel discussion of industry experts, the webinar addressed potential solutions and proactive strategies for improving material quality and treatment solutions to ensure high manufacturing yield.

This webinar features a presentation from Nabil Mistkawi, Samsung Austin Semiconductor, who identifies key technology requirements for wet chemicals and gases from an end user perspective. This was followed by an engaging discussion between tool OEM companies and end users, as they explored the contamination control needs of individual environments, showing where contamination impacts the process, thereby bringing together the supply chain with the clean room.

This webinar begins with Slava Libman, FTD Solutions, presenting the annual International Roadmap for Devices and Systems (IRDS) and SEMI Standards Update. Following the presentation we continue with a panel discussion exploring risk management, resilience, and sustainability within the industry. Using the IRDS roadmap as an outline, our expert panellists discuss the continuing need for making improvements to technological gaps and facilities’ environmental footprints, whilst building a secure and sustainable future for the industry.

This presentation was given at the Ultrapure Micro 2020 annual conference. It was presented as a Keynote presentation.

This presentation was given at the Ultrapure Micro 2020 annual conference. It was presented in the Ultrapure Water Production track, as part of the UPW Contamination Control session.

This presentation was given at the Ultrapure Micro 2020 annual conference. It was presented in the Ultrapure Water Production track, as part of the Wafer Contamination Control - Particles Monitoring session.

This presentation was given at the Ultrapure Micro 2018 annual conference. It was presented during the Learning Series, as part of the Ultrapure Water Production track.

This presentation was given at the Ultrapure Micro 2019 annual conference. It was presented as a Keynote presentation.