How to Rate a Sub 10nm Filter
Date published: 2016
Please login or subscribe to view UPM Resources.
This presentation was given at the Ultrapure Micro 2016 annual conference. It was presented in the Ultrapure Water Production track, as part of the Particle Control session.
Companies: Pall;
Authors: Gerd Heser; Jochen Ruth;
Tags: SEMI; Filtration; Particle Count and Detection
Related resources
Id | Year | Materials | Info | Company | Author | Tags | View |
---|---|---|---|---|---|---|---|
... | 2021 |
Please login or subscribe to view UPM Resources. |
Study on particle behavior in ultrapure waterThis presentation was given as part of the Ultrapure Micro 2021 annual conference. It was given as part of the ultrapure water strand.
|
Kurita Water Industries; | Yoichi Tanaka; HIDEAKI IINO; Minoru Uchida; Takaaki Togo; Toshimasa Kato; Yuichi Ogawa | Filtration; Particles; Particle Count and Detection | View |
... | 2021 |
Please login or subscribe to view UPM Resources. |
Evaluating three generations of UPW filtration technology using SEMI C79This presentation was given as part of the Ultrapure Micro 2021 annual conference. It was given as part of the ultra high purity chemicals strand.
|
Intel; CT Associates; | Ryan Pavlick; Gary van Schooneveld; Sriram Ramamoorthy; David Neitling; Hokkin Choi; Vani Thirumala; Vindhya | SEMI; Filtration; End-user | View |
... | 2017 |
Please login or subscribe to view UPM Resources. |
Using Particle Scout™ for testing filtersThis article deliberates how it has become possible to test any microfine filter in real time, and in its actual conditions of use. For such testing to be possible it is vital to be able to obtain two particle-counting instruments matched for particle detection over a range of particle sizes. This attribute of matched detection appears to be possible with the acoustic method of detecting particles, and not commonly available with optical particle counters. This article was originally published in the Ultrapure Micro Journal in November 2017.
|
Unicopiers | Sameer Madanshetty | Particles; Filtration; Particle Count and Detection | View |
... | 2020 |
Please login or subscribe to view UPM Resources. |
Semiconductor Industry Needs in UPW and Water Management During Turbulent TimesThis webinar begins with Slava Libman, FTD Solutions, presenting the annual International Roadmap for Devices and Systems (IRDS) and SEMI Standards Update. Following the presentation we continue with a panel discussion exploring risk management, resilience, and sustainability within the industry. Using the IRDS roadmap as an outline, our expert panellists discuss the continuing need for making improvements to technological gaps and facilities’ environmental footprints, whilst building a secure and sustainable future for the industry.
|
FTD Solutions; Intel; Page; Evoqua Water Technologies; Enviro-Energy Solutions; | Slava Libman; Rushi Matkar; Alex Milshteen; Bob McIntosh; Alan Knapp; Dan Wilcox; | IRDS; SEMI; Environmental Impact and Compliance; Risk Management; Particle Count and Detection | View |
... | 2020 |
Please login or subscribe to view UPM Resources. |
UPW Contamination Control - Q&AThis Q&A session took place at the 2020 Ultrapure Micro annual conference. It was a part of the Ultrapure Water Production track, and included speakers from the UPW Contamination Control session.
|
Intel; Particle Measuring Systems; Organo; | Glen Slayter; Dan Rodier; Kyohei Tsutano; Sid Sampath | Particle Count and Detection; Metal Contamination; Filtration; Nanoparticles | View |
... | 2020 |
Please login or subscribe to view UPM Resources. |
Removal of trace metals from Ultra Pure Water (UPW) using membrane-based solutionsThis presentation was given at the Ultrapure Micro 2020 annual conference. It was presented in the Ultrapure Water Production track, as part of the UPW Contamination Control session.
|
Ashutosh Bhabhe; Brant Kim; Jad Jaber; James Hamzik; Justin Brewster; Nathaniel Goff | Metal Contamination; Silica; IRDS; SEMI; Filtration | View | |
... | 2019 |
Please login or subscribe to view UPM Resources. |
Particle ControlThis presentation was given at the Ultrapure Micro 2019 annual conference. It was presented during the Learning Series, as part of the Ultrapure Water Production track.
|
CT Associates; Pall; | Gary van Schooneveld; Ted Caramberis | Metrology and Analytical Technology; Case Study; Particle Count and Detection; Filtration | View |
... | 2019 |
Please login or subscribe to view UPM Resources. |
Measuring the Particle Retention of Liquid Filters below 100 NanometersThis presentation was given at the Ultrapure Micro 2019 annual conference. It was presented during the Learning Series, as part of the Ultrapure Water Production track.
|
CT Associates; Pall; | Gary van Schooneveld; Ted Caramberis | Particles; SEMI; Filtration; Nanoparticles | View |
... | 2019 |
Please login or subscribe to view UPM Resources. |
UPW IRDS and SEMI: Reinforced Process of Enabling Advanced Existing and Future Semiconductor TechnologiesThis presentation was given at the Ultrapure Micro 2019 annual conference. It was presented as a Keynote presentation.
|
FTD Solutions; | Slava Libman; | IRDS; SEMI; Particle Precursors; Distribution Systems; Particle Count and Detection | View |
... | 2019 |
Please login or subscribe to view UPM Resources. |
Advanced Microscopy for Quantification and Identification in UPW, Process Chemicals, and Industrial GasesThis presentation was given at the Ultrapure Micro 2019 annual conference. It was presented in the Ultra High Performance Chemicals and High Purity Gases track, as part of the Nanoscale Analytical: PPW? session.
|
Air Liquide; | Fang Li; | Nanoparticles; Metrology and Analytical Technology; Filtration; Particle Count and Detection; High Purity Gases | View |