Ion Exchange Resins for Advanced Removal of Nanoparticles from UPW? – A Novel Imaging Approach
Date published: 2019
Please login or subscribe to view UPM Resources.
This presentation was given at the Ultrapure Micro 2019 annual conference. It was presented in the Ultrapure Water Production track, as part of the Enabling Technology session.
Companies: Ovivo; Karlsruhe Institute of Technology
Authors: Pia Herrling; Philippe Rychen; Gisela Guthause; Katharina Kopania
Tags: Nanoparticles; Ion Exchange; UPW Polishing; Metrology and Analytical Technology
Related resources
| Year | Materials | Info | Company | Author | Tags | View |
|---|---|---|---|---|---|---|
| 2021 |
Log in or subscribe to view recordings. |
Proactive quality management in the UPW polish systemThis presentation was given as part of the Ultrapure Micro 2021 annual conference. It was given as part of the ultrapure water strand.
|
FTD Solutions; Intel; CT Associates; | Bonnie Marion; Peter Maenke; Gary van Schooneveld; Josh Best; Slava Libman; Rushi Matkar; | UPW Polishing; Particles; Ion Exchange; End-user | View |
| 2021 |
Log in or subscribe to view recordings. |
Nanoparticles characterisation for semiconductor UPW production system monitoring using ICP-MSThis presentation was given as part of the Ultrapure Micro 2021 annual conference. It was given as part of the ultrapure water strand.
|
Air Liquide; | Jinjin Wang; Fuhe Li | Nanoparticles; UPW System; Metrology and Analytical Technology; Particle Count and Detection | View |
| 2021 |
Log in or subscribe to view recordings. |
The UPW filter cascade - functions, risks and recommendationsThis presentation was given as part of the Ultrapure Micro 2021 annual conference. It was given as part of the ultrapure water strand.
|
Pall; RBFM Consulting | Jochen Ruth; Gerd Heser; Rolf Berndt | Filtration; Nanoparticles; UPW Polishing; Silica | View |
| 2021 |
Log in or subscribe to view recordings. |
Measurement of nanoparticles and their precursorsThis presentation was given as part of the Ultrapure Micro 2021 annual conference. It was given as part of the airborne molecular contamination (AMC) and high purity gases control strand.
|
Airmodus; | Joonas Vanhanen; | Airborne Molecular Contamination (AMC); Nanoparticles; Metrology and Analytical Technology; Particle Precursors; Particle Count and Detection | View |
| 2021 |
Log in or subscribe to view recordings. |
Nanoparticle adsorption of polish IEX resins investigated by magnetic resonance imagingThis presentation was given as part of the Ultrapure Micro 2021 annual conference. It was given as part of the ultrapure water strand.
|
Ovivo; Karlsruhe Institute of Technology | Pia Herrling; Philippe Rychen; Frando Sinaga; Gisela Guthausen; Nicolas Schork | UPW Polishing; Ion Exchange; Nanoparticle; Particle Count and Detection | View |
| 2020 |
Log in or subscribe to view recordings. |
Microanalysis: A novel method to characterize and speciate contaminants in Ultra Pure Water (UPW) and other aqueous chemicalsThis presentation was given at the Ultrapure Micro 2020 annual conference. It was presented in the Ultrapure Water Production track, as part of the Wafer Contamination Control - Particles Monitoring session.
|
Entegris; Intel; | Ashutosh Bhabhe; Rushi Matkar; Glen Slayter; Mitchell Kilroy; Suwen Liu | Metrology and Analytical Technology; Case Study; UPW System; Hydrogen Peroxide (H2O2); UPW Polishing | View |
| 2020 |
Log in or subscribe to view recordings. |
Determine functional pore sizes of ultrafiltration membranes by nanoparticle retention test using single particle ICP-MSThis presentation was given at the Ultrapure Micro 2020 annual conference. It was presented in the Ultrapure Water Production track, as part of the UPW Process Optimization session.
|
3M; | Charlie Chan; Jinseng Zhou; Majid Entezarian; Robert Gieger | Nanoparticles; Membranes; Metrology and Analytical Technology | View |
| 2020 |
Log in or subscribe to view recordings. |
Can Nanoparticles penetrate UPW polishing resins? Nanoscale particle interactions by high resolution imaging of single resin beadsThis presentation was given at the Ultrapure Micro 2020 annual conference. It was presented in the Ultrapure Water Production track, as part of the UPW Process Optimization session.
|
Ovivo; Karlsruhe Institute of Technology | Pia Herrling; Philippe Rychen; Eva Mayrose; Gisela Guthausen | Nanoparticles; UPW Polishing; Ion Exchange; Metrology and Analytical Technology | View |
| 2020 |
Log in or subscribe to view recordings. |
Understanding Nanoparticle Contamination in Ultrapure Water Generation and DistributionThis presentation was given at the Ultrapure Micro 2020 annual conference. It was presented in the Ultrapure Water Production track, as part of the UPW Contamination Control session.
|
Intel; Particle Measuring Systems; | Glen Slayter; Dan Rodier; | End-user; Nanoparticles; Particle Count and Detection; Metrology and Analytical Technology; Case Study; UPW Polishing | View |
| 2020 |
Log in or subscribe to view recordings. |
UPW Process Optimization - Q&AThis Q&A session took place at the 2020 Ultrapure Micro annual conference. It was a part of the Ultrapure Water Production track, and included speakers from the UPW Process Optimization session.
|
3M; FTD Solutions; Ovivo; | Gil Maron; Pia Herrling; Charlie Chan | Metrology and Analytical Technology; Nanoparticles; Membranes; Ion Exchange; UPW Polishing | View |