Ultrapure CO2 Supply and Recycle System for the Supercritical CO2 Drying Process in Nano-Scale Semiconductor Manufacturing​

Critical feature sizes of modern semiconductor devices have surpassed the capabilities of traditional optical-based methods to measure particle concentrations in process chemicals and on wafers. Without adequate metrology for quantifying particle and particle precursor concentration in process chemicals, device makers face challenges correlating component failures and fabrication steps. This is especially true for organic material released by Final Polish Ion Exchange resin during a rinse cycle, which is not detected efficiently using optical methods. In this work, we describe two state-of-the-art measurement methods that can detect organic particles and particle precursors to 3 nm using Aerosolization and Threshold Particle Counting (TPC) and defects from UPW deposited on a wafer surface down to 8 nm using Surfaced Enhanced Particle Sizing (SEPS)

This provides greater visibility to the material manufacturing process, which complements a risk-based approach to material disposition and facilitates timely response to inline material signals. Gases have not historically resulted in the same level of fab process impact at legacy nodes; however, excursion impact of raw materials has increased exponentially at smaller and smaller nodes. More frequently, gas excursions have resulted from isolated process, raw material, and cylinder-level abnormalities not characterized on the COA. This impact has driven the need for a similar COA expansion approach within high purity gases, for quality assurance. In preparation for EUV nodes, the overall gap in analytical capability, characterization, and control between the Asian and US markets, further drives the need for this supply chain visibility. Therefore, investment and innovation in US high purity gas supply chains will be critical to achieving yield ramp in EUV nodes.

This presentation was given as part of the Ultrapure Micro 2021 annual conference. It was given as part of the combined track, which contained presentations on airborne molecular contamination (AMC) and high purity gases, and ultra high purity chemicals.

This presentation was given as part of the Ultrapure Micro 2021 annual conference. It was given as part of the airborne molecular contamination (AMC) and high purity gases control strand.

This presentation was given as part of the Ultrapure Micro 2021 annual conference. It was given as part of the ultrapure water strand.

This presentation was given as part of the Ultrapure Micro 2021 annual conference. It was given as part of the airborne molecular contamination (AMC) and high purity gases control strand.

This presentation was given as part of the Ultrapure Micro 2021 annual conference. It was given as part of the airborne molecular contamination (AMC) and high purity gases control strand.

This Q&A session took place at the 2020 Ultrapure Micro annual conference. It was a part of the AMC, Liquid Chemicals & Gases Control track, and included speakers from the Airborne Molecular Contamination (AMC) and High Purity Gases Control session.

This presentation was given at the Ultrapure Micro 2020 annual conference. It was presented in the Ultrapure Water Production track, as part of the UPW Contamination Control session.

This presentation was given at the Ultrapure Micro 2019 annual conference. It was presented during the Learning Series, as part of the Ultrapure Water Production track.