Xe Recovery and Reuse System​ from Etching Process Exhaust Gas​

This provides greater visibility to the material manufacturing process, which complements a risk-based approach to material disposition and facilitates timely response to inline material signals. Gases have not historically resulted in the same level of fab process impact at legacy nodes; however, excursion impact of raw materials has increased exponentially at smaller and smaller nodes. More frequently, gas excursions have resulted from isolated process, raw material, and cylinder-level abnormalities not characterized on the COA. This impact has driven the need for a similar COA expansion approach within high purity gases, for quality assurance. In preparation for EUV nodes, the overall gap in analytical capability, characterization, and control between the Asian and US markets, further drives the need for this supply chain visibility. Therefore, investment and innovation in US high purity gas supply chains will be critical to achieving yield ramp in EUV nodes.

This presentation was given as part of the Ultrapure Micro 2021 annual conference. It was given as part of the airborne molecular contamination (AMC) and high purity gases control strand.

This presentation was given as part of the Ultrapure Micro 2021 annual conference. It was given as part of the airborne molecular contamination (AMC) and high purity gases control strand.

This Q&A session took place at the 2020 Ultrapure Micro annual conference. It was a part of the AMC, Liquid Chemicals & Gases Control track, and included speakers from the Airborne Molecular Contamination (AMC) and High Purity Gases Control session.

This presentation was given at the Ultrapure Micro 2019 annual conference. It was presented in the Ultra High Performance Chemicals and High Purity Gases track, as part of the High Purity Gases & Precursors session.

This presentation was given at the Ultrapure Micro 2019 annual conference. It was presented in the Ultra High Performance Chemicals and High Purity Gases track, as part of the Nanoscale Analytical: PPW? session.